1976
DOI: 10.1002/pssb.2220780230
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Self‐diffusion in nickel at low temperatures

Abstract: Self-diffusion in nickel single crystals is measured between 813 and 1193K using ion-beam sputtering as e microsectioning technique. Gaussian activity-depth profiles are observed over about three orders of magnitude in the activity decrease. The bulk diffusivities obtained from these profiles are analysed in conjunction with Bakker's high temperature data. The monovacancy contribution to the lattice diffusivity is given by DIV = 0.92 exp (-2.88 eV/kT) cmZ/s. Preliminary isotope effect experiments are also perf… Show more

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Cited by 206 publications
(75 citation statements)
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“…Unlike Ni foam templates with unit cell sizes of the order of hundreds of microns, 1 the sub-micron unit cells of Ni gyroid templates transform into bulky clusters at temperatures >500 o C. The formation of clusters is driven by the thermodynamic tendency to minimise the surface area, enabled by the increase in Ni self-diffusion with temperature. 37 Using a typical one-step CVD process, 18 where the hydrocarbon precursor is introduced only once the growth temperature has been reached, both G35_Ni and G60_Ni do not preserve their original morphologies and transform into large clusters already during the heating ramp (Fig. 4a).…”
Section: Fig 3 (A) Raman Spectra Of: Graphene On a 500 Nm Thick Ni mentioning
confidence: 99%
See 1 more Smart Citation
“…Unlike Ni foam templates with unit cell sizes of the order of hundreds of microns, 1 the sub-micron unit cells of Ni gyroid templates transform into bulky clusters at temperatures >500 o C. The formation of clusters is driven by the thermodynamic tendency to minimise the surface area, enabled by the increase in Ni self-diffusion with temperature. 37 Using a typical one-step CVD process, 18 where the hydrocarbon precursor is introduced only once the growth temperature has been reached, both G35_Ni and G60_Ni do not preserve their original morphologies and transform into large clusters already during the heating ramp (Fig. 4a).…”
Section: Fig 3 (A) Raman Spectra Of: Graphene On a 500 Nm Thick Ni mentioning
confidence: 99%
“…The suitability of a given metal template will depend on its catalytic efficiency to induce graphitisation compared to its self-diffusivity at the given CVD temperature. Hence the temperature instabilities of sub-micron unit cell structures can be similarly addressed for metals that in those respects show a similar behaviour to Ni, 37 such as Co, 43 or for metals, that require higher growth temperatures but have lower self-diffusivities, such as Pt. [44][45][46] For metals, such as Cu, that require higher temperatures for graphene growth and have high self-diffusivities (3 orders of magnitude higher for Cu than Ni at 900 °C), 47,48 successfully applying our approach may be more challenging.…”
Section: Fig 3 (A) Raman Spectra Of: Graphene On a 500 Nm Thick Ni mentioning
confidence: 99%
“…At SOFC operating temperatures, the bulk self-diffusion for metals typically used in SOFC anodes $ 10 À16 m 2 s À1 [22], whereas for surface self-diffusion of these metals D s $ 10 À11 m 2 s À1 [23]. It is also worth noting that the Zr 4þ surface diffusion coefficient in YSZ is $ 10 À18 m 2 s À1 [24].…”
Section: Diffuse-interface Formalismmentioning
confidence: 99%
“…This value was found to be on the order of 10 -5 m 2 /s for the dilute diffusion of transition metals in Ni [2,31]. Thus, 10 -5 m 2 /s will be used for the diffusion prefactor in this work as an approximation, a value that well represents the experimental diffusion prefactor of pure Ni (8.5×10 -5 -17.7×10 -5 m 2 /s [33][34][35]). …”
Section: Diffusion Coefficient Calculationmentioning
confidence: 89%