The
functionality of porphyrin/oxide interfaces depends on both
the structure of the organic layer and the metalation of the porphyrin
units. While the structure of the porphyrin film is known to be controlled
by the oxide surface, little is known on the structure dependence
of the self-metalation reaction. In this work, we investigated both
the anchoring and the self-metalation reaction of 5-(4-carboxyphenyl)-10,15,20-triphenylporphyrin
(MCTPP) on three atomically-defined oxide thin films, namely Co3O4(111), CoO(111), and CoO(100), under ultrahigh
vacuum conditions. We used infrared reflection absorption spectroscopy
to follow the growth and self-metalation reaction in-situ as a function
of coverage and temperature. At 300 K, MCTPP binds to Co3O4(111) in the form of a chelating surface bidentate carboxylate,
whereas bridging carboxylates are found on CoO(111) and CoO(100).
MCTPP multilayers desorb between 450 and 460 K on all oxides. However,
monolayer species reside on the Co3O4(111) surface
up to temperatures of 590 ± 5 K, similar as observed for CoO(100)
(575 ± 5 K). On CoO(111), the anchored carboxylates are more
strongly bound and remain up to 690 ± 5 K. Finally, we observed
that the self-metalation reaction is strongly dependent on the surface
structure and temperature. At 300 K, the degree of metalation is low
(<10%) on all surfaces. At 450 K, however, we observe self-metalation
of 60 ± 10% of the porphyrins on CoO(111) and CoO(100) in the
monolayer. In sharp contrast, no increase in the metalation rate is
observed for the deposition of MCTPP on Co3O4(111) at 450 K. Our results show that the adsorption motif, the molecular
orientation, and the metalation reaction are strongly dependent on
the oxide surface structure and, in particular, on the arrangement
and distance of the Co cations in the surface region.