The strong thickness-dependent narrow
direct band gap of few-layer
α-In2Se3 makes it a promising candidate
for high-performance photodetectors. However, few researchers focus
on the relationship between thickness and optoelectronic characteristics,
and most results are based on the mechanically exfoliated α-In2Se3 nanoflakes. Herein, a reliable physical vapor
deposition strategy to grow α-In2Se3 nanosheets
with tunable thickness and submillimeter scale is reported. High-resolution
transmission electron microscopy (HRTEM), Raman spectroscopy, and
X-ray photoelectron spectroscopy (XPS) studies confirmed the high-quality
growth of α-In2Se3 nanosheets. The back-gate
field-effect transistors on SiO2 substrates display n-type
semiconductor behavior. A systematical investigation of the optoelectronic
properties reveals a thickness-dependent broadband response from visible
(447 nm) to near-infrared (1550 nm) wavelengths with better and excellent
performance obtained in thicker α-In2Se3 nanosheets than that in thinner devices. More importantly, a great
improvement of the responsivity, detectivity, and external quantum
efficiency (EQE) can be achieved by changing the thickness of In2Se3. The photodetector exhibits an outstanding
photoresponsivity of 347.6 A/W, an ultrahigh detectivity of 1.5 ×
1013 Jones, and an external quantum efficiency of 8.3 ×
104%, which is superior to several α-In2Se3 nanostructure- or other two-dimensional (2D)-based
photodetectors. The thickness-dependent broadband response characteristics
make the α-In2Se3 nanostructure a promising
candidate for multifunctional optoelectronic device applications.