Self-texturing of nitrogenated amorphous carbon thin films for electron field emission

Abstract

The electron field-emission process for nitrogenated amorphous carbon ͑a-C:H:N͒ thin films deposited using a magnetically confined hydrocarbon plasma is examined. The morphology of the films obtained using an atomic force microscope is compared to the field-emission properties. Beyond a chemical composition of 14 at. % nitrogen, the mirror smooth a-C:H:N films become self-texturing, and multiple ''domelike'' cathodes of nanometer scale are observed. The dimensions of these ''domelike'' cathodes varies with time, and after a 15 min deposition have dimensions of approximately 50 nm base diameter and 20 nm in height. When the electronic field emission of these textured films ͑N content 15 at. %͒ are measured, there is an enhancement in the emitted current density of ϳ2 orders of magnitude at an electric field of 20 V/ m, in comparison to the untextured films with a nitrogen content of 11 at. %.

Influence of Silver Incorporation on the Structural and Electrical Properties of Diamond-Like Carbon Thin Films

“…Previous studies of DLC based field emission devices have shown E T can be as high as 10 -20 V/μm. For example, llie et al 15 have found E T in the range 21 V/μm to 10 V/μm in amorphous carbon films, whereas Silva et al 16 have found E T close to 5 V/μm in nanostructured DLC films having N contents as high as 11 at.% and 15 at.%. Forrest et al 17 examined the effect of the thickness of hydrogenated DLC (a-C:H) and nitrogenated tetrahedral amorphous carbon (ta-C:N) films on the field emission characteristics of their films and found high values of E T in a-C:H films which varied between 60 V/μm and 10 V/μm, though lower values were found in ta-C:N films.…”

A study of electron field emission as a function of film thickness from amorphous carbon films

“…[1][2][3] Thin amorphous carbon films are a possible cold cathode material [4][5][6] for use in FPDs. For this to come to fruition the lifetime and emission site density of these materials needs to be maximized for low operating electric fields to levels at which a display device may be technically and commercially viable.…”

Post-annealing effect in reactive r.f.-magnetron-sputtered carbon nitride thin films

“…The amorphous carbon nitride films obtained are, themselves, useful because they have properties such as high hardness and wear resistivity, chemical inertness, lack of magnetic response and optical gap ranging from zero to a few electron-volts, depending upon the nitrogen concentration and deposition conditions. 14,15 A few of the experimental studies resulted in polycrystalline material, 5 -7,9,16 whereas some authors claimed to have produced nanocrystallites embedded in an amorphous matrix 11,13 showing the expected crystal structure ofˇ-C 3 N 4 .…”