Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metal–organic chemical vapour deposition

Abstract

The unique structural and electronic properties of transition metal dichalcogenides (TMDs) and in particular tungsten disulphide (WS2) makes it interesting for a variety of applications such as electrocatalytic hydrogen evolution...

Nucleation and growth studies of large-area deposited WS2 on flexible substrates

“…In this study the WS 2 films were grown using an all nitrogen-coordinated bis-imido-bis-amido precursor namely [W(N t Bu) 2 (N i Pr 2 ) 2 ] and elemental sulphur. The deposition procedure followed was similar to that recently reported for WS 2 on Si substrates, where the suitability of the precursor for processes at moderate temperatures has been demonstrated as crystalline film growth below 700 °C was observed [34]. Thus, the process temperature, the precursor source and co-reactants are fixed according to the optimized deposition process for [W(N t Bu) 2 (N i Pr 2 ) 2 ] [34] and here we focus exclusively on the influence of the substrate on the growth process.…”

“…WS 2 samples were grown on 1 cm × 1 cm muscovite mica and flexible glass AF 32 ® eco substrates in a homebuilt CVD reactor as reported in previous work [34]. The muscovite mica substrates were freshly cleaved instantly before the deposition and the glass substrates, were cleaned with acetone and isopropanol before the WS 2 growth.…”

“…Thus, to close the gap between laboratory research and industrial implementation, large-scale deposition techniques need to be investigated, understood and developed. The common approaches for obtaining large-area TMDC films are atomic layer deposition (ALD) [6][7][8], chemical vapor deposition (CVD) [9][10][11][12][13], physical vapor deposition (PVD) [14,15] and thermal vapor sulfurization on a metal or metal oxide [16][17][18]. ALD processes are very attractive for flexible electronics because of the low deposition temperatures, but the resulting films often show poor crystallinity [8,19,20].…”

Single-Source Precursors for the Chemical Vapor Deposition of Group 4–6 Transition Metal Dichalcogenides

“…SEM showed vertically oriented platelets, which have been seen before in samples of 2H-WS 2 . 56,57 Dithiocarbamate Precursor Mixtures. AACVD offers the ability to deposit complex materials by using mixtures of SSPs for the individual components dissolved in the same solution.…”

Atomic order transition of TiNiPt nanoparticles supported on carbon nanotubes for the stable hydrogen evolution reaction

“…The hydrogen evolution reaction (HER) is a key reaction in energy conversion applications such as renewable energy and hydrogen fuel cells. [1][2][3][4][5] Pt is currently considered to be the best HER electrocatalyst, but its low abundance, high cost, low utilization rate, and limited stability limit its development. [6][7][8][9][10] Reducing the amount of Pt and improving the catalytic activity can be achieved by combining Pt with transition metals (such as Ni, 11 W, 12 Ti, 13 Mo, 14 Fe, 15 and Te 16 ).…”