2017
DOI: 10.1016/j.jcrysgro.2016.11.029
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Sensitivity of heterointerfaces on emission wavelength of quantum cascade lasers

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Cited by 19 publications
(21 citation statements)
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“…Lattice-matched InAlAs/InGaAs QCL active regions grown by molecular beam epitaxy (MBE) also exhibit four monolayers of compositional grading in the interfaces [10]. Indium segregation was not indicated at any interfaces in either of the SLs studied here, unlike what was reported in Ref [2].…”
Section: Extent Of Interfacial Mixing In the Thin-motif Samplecontrasting
confidence: 49%
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“…Lattice-matched InAlAs/InGaAs QCL active regions grown by molecular beam epitaxy (MBE) also exhibit four monolayers of compositional grading in the interfaces [10]. Indium segregation was not indicated at any interfaces in either of the SLs studied here, unlike what was reported in Ref [2].…”
Section: Extent Of Interfacial Mixing In the Thin-motif Samplecontrasting
confidence: 49%
“…The veracity of the asymmetry could be tested by running the atom probe experiments from the substrate down, in the opposite direction to that used in this study, but such experiments have not yet been achieved. Asymmetric graded interfaces (2.5-4.5 nm in width) have also been observed for lattice-matched InAlAs/InGaAs SL structures grown by OMVPE [2], and for InGaAsP multiple quantum well (MQW) structures where Ga and As are diffused asymmetrically into the lower and upper InP buffer layers [14], as well as for InGaN/GaN quantum wells where the upper InGaN/GaN interface is found to be 1.3 nm wide and the lower interface is 0.6 nm wide, in that study [15]. Lattice-matched InAlAs/InGaAs QCL active regions grown by molecular beam epitaxy (MBE) also exhibit four monolayers of compositional grading in the interfaces [10].…”
Section: Extent Of Interfacial Mixing In the Thin-motif Samplementioning
confidence: 71%
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“…Microdefects in InAlAs/InP described in the literature were reported to depend strongly on the growth conditions, with a rather narrow range of technological parameters of microdefects-free growth [9,12,17] around 500 °C, also with improved InAlAs properties at much higher temperatures around 600 °C [18] or around 650-750°C used in MOVPE [19]. During the growth of test structures, the optical reflectometry signal was collected in real time, similarly as described above for QCL growth.…”
Section: Background Of the Problemmentioning
confidence: 99%