2011
DOI: 10.1016/j.ijms.2010.11.019
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Sequential IRMPD of XGe(OEt)4− ions: Gas-phase synthesis of novel oxy-germanium anions

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Cited by 3 publications
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“…Because organosilanes and related organometallic species containing Ge, Sn, Ti, and other metals are commonly used as the starting substrates for processes leading to a rich variety of materials, it is important to establish whether this type of exchange reaction can be promoted and extended to other systems. In this respect, the gas-phase ion chemistry and the initial reactivity pattern of Si, Ge, and Ti alkoxides have been previously characterized in these laboratories to provide some insight on the mechanisms of these reactions. A similar approach has been used in our present work to explore the gas-phase reactivity of R 3 SiO – , R 3 GeO – , and R 3 CO – anions with different potential fluorine donors using FT-ICR mass spectrometry.…”
Section: Introductionmentioning
confidence: 99%
“…Because organosilanes and related organometallic species containing Ge, Sn, Ti, and other metals are commonly used as the starting substrates for processes leading to a rich variety of materials, it is important to establish whether this type of exchange reaction can be promoted and extended to other systems. In this respect, the gas-phase ion chemistry and the initial reactivity pattern of Si, Ge, and Ti alkoxides have been previously characterized in these laboratories to provide some insight on the mechanisms of these reactions. A similar approach has been used in our present work to explore the gas-phase reactivity of R 3 SiO – , R 3 GeO – , and R 3 CO – anions with different potential fluorine donors using FT-ICR mass spectrometry.…”
Section: Introductionmentioning
confidence: 99%