2011
DOI: 10.1557/jmr.2010.99
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Sequential multiplication of dislocation sources along a crack front revealed by high-voltage electron microscopy and tomography

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Cited by 16 publications
(13 citation statements)
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“…The test temperature is sufficient for dislocation climb to occur. Dislocation cross slip has been reported to occur near a stress concentrator such as a crack tip at 973 K, 16 although cross slip was not observed often in this study. The expansion of a dislocation loop via climb is discussed next.…”
Section: Resultscontrasting
confidence: 55%
“…The test temperature is sufficient for dislocation climb to occur. Dislocation cross slip has been reported to occur near a stress concentrator such as a crack tip at 973 K, 16 although cross slip was not observed often in this study. The expansion of a dislocation loop via climb is discussed next.…”
Section: Resultscontrasting
confidence: 55%
“…Three groups have reported using in-situ TEM at 200 kV to observe hydrogen desorption 15 17 18 . However, conventional TEM with an accelerating voltage of 200 kV has disadvantages including inelastic incident beam interactions with the samples, and the sample dimensions (typically less than 100 nm in thickness) make surface effects more prominent 19 . Recently Mooij and Dam 20 demonstrated in-situ the two dimensional nucleation and growth of single hydride domains of up to several millimeters in diameter by an optical transmission technique (hydrogenography) for thin Mg film.…”
mentioning
confidence: 99%
“…Secondly, conventional TEM with an accelerating voltage of 200 kV–300 kV has disadvantages including inelastic incident beam interactions with the samples, and the sample dimensions (typically less than 100 nm in thickness) make surface effects more prominent10, which becomes particularly important in small samples with a high specific surface area. In this aspect, UHV-TEM is more favorable for determining the mechanism of hydrogen release in real-time.…”
Section: Dehydrogenation Of Mgh2 or Diffusion Of Mg And Kirkendall Vomentioning
confidence: 99%