“…10, variation of reemission behavior with the normalized temperature (T m ) by the melting point of each metal can be characterized into four different temperature ranges. Here we have tried to correlate He reemission, He migration and microstructure developed by He implantation [1,2,[6][7][8][9][10][11] for four temperature ranges as follows. Although Sinha et al [7] gave clear temperature dependence of He blistering in Ni, their incident energy of He ions of 500 keV was too high to observe fuzz structure or more detailed surface structure appeared in Fig.…”