“…Since block copolymer domains nucleate at random positions with a random orientational phase, the appearance of topological defects at the interfaces of different domains is completely unavoidable, and several strategies, such as graphoepitaxy or external ordering fields, have been employed to obtain ordered hexagonal and lamellar masks with a low density of topological defects [11,12]. For example, by employing a shearing technique, Angelescu et al [13] showed that thin films of sphere-forming block copolymers can be well aligned over square-centimetre regions. Compared with thermal treatments, where the density of topological defects can hardly be reduced below 200 dislocations per square micrometre, in shear-aligned hexagonal patterns the orientational order was perfect over a 2.5 × 2.5 mm 2 area while the translational order was limited only by the presence of a reduced number of dislocations (on average six dislocations per square micrometre).…”