Sheath Model for Dual-Frequency Capacitively Coupled Plasmas

Denpoh, Kazuki; Wakayama, Go; Nanbu, Kenichi

doi:10.1143/jjap.43.5533

Cited by 45 publications

(78 citation statements)

References 7 publications

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“…The increasing HF voltage with increasing LF power is attributed to the coupling effect between the HF and LF source. 32,46 As a result, the stochastic heating is enhanced and the number of high-energy electrons increases with the LF power at the HF power of 30 W, which can also be confirmed by the EEPFs from the simulation in Fig. 9(a).…”

Section: B Effects Of Lf Powersupporting

confidence: 61%

Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges

Liu¹,

Wen²,

Liu³

et al. 2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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The electron density is measured in low-pressure dual-frequency (2/60 MHz) capacitively coupled oxygen discharges by utilizing a floating hairpin probe. The dependence of electron density at the discharge center on the high frequency (HF) power, low frequency (LF) power, and gas pressure are investigated in detail. A (1D) particle-in-cell/Monte Carlo method is developed to calculate the time-averaged electron density at the discharge center and the simulation results are compared with the experimental ones, and general agreements are achieved. With increasing HF power, the electron density linearly increases. The electron density exhibits different changes with the LF power at different HF powers. At low HF powers (e.g., 30 W in our experiment), the electron density increases with increasing LF power while the electron density decreases with increasing LF power at relatively high HF powers (e.g., 120 W in our experiment). With increasing gas pressure the electron density first increases rapidly to reach a maximum value and then decreases slowly due to the combined effect of the production process by the ionization and the loss processes including the surface and volume losses.

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Section: B Effects Of Lf Powersupporting

confidence: 61%

Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges

Liu¹,

Wen²,

Liu³

et al. 2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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show abstract

“…So it is actually required that the non-drifting portion of the electron velocity distribution function is not Maxwellian. In accordance with the discussion above, we assume that the positive ion density n i is given by a suitable sheath model [13,16], and that in this quasi-neutral region n n i , so n is given. From the specification of the current density, eq.…”

Section: Collisionless Heatingmentioning

confidence: 99%

Electron heating mechanisms in dual-frequency capacitive discharges

Turner

Chabert

2007

Plasma Sources Sci. Technol.

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Abstract. We discuss electron heating mechanisms in the sheath regions of dualfrequency capacitive discharges, with the twin aims of identifying the dominant mechanisms and supplying closed-form expressions from which the heating power can be estimated. We show that the heating effect produced by either Ohmic or collisionless heating is much larger when the discharge is excited by a superposition of currents at two frequencies than if either current had acted alone. This coupling effect occurs because the lower frequency current, while not directly heating the electrons to any great extent, strongly affects the spatial structure of the discharge in the sheath regions.

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“…Nonlinear sheath motion can be incorporated into COMSOL Multiphysics by giving it an analytical sheath potential of dual-frequency CCPs, 3) which is an extension of Lieberman's rf sheath theory. 2) The sheath potential V s at a time t is described, for…”

mentioning

confidence: 99%

Semianalytical Finite Element Method Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas

Denpoh¹,

Shirafuji

2009

Jpn. J. Appl. Phys.

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We propose a semianalytical rf sheath model for single-and dual-frequency capacitively coupled plasmas (CCPs) based on the finite element method (FEM). The one-dimensional nonlinear rf sheath theory and its extension to dual-frequency CCPs are incorporated into the commercial FEM software COMSOL Multiphysics and coupled with the Poisson solver in it. The model enables a time-dependent but rapid simulation of the nonlinear motion of an rf sheath formed around an arbitrary surface geometry of a local region in a single-or dualfrequency CCP. Some application results obtained using the model are demonstrated and validated.

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Sheath Model for Dual-Frequency Capacitively Coupled Plasmas

Cited by 45 publications

References 7 publications

Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges

Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges

Electron heating mechanisms in dual-frequency capacitive discharges

Semianalytical Finite Element Method Model for Radio Frequency Sheaths in Single- and Dual-Frequency Capacitively Coupled Plasmas

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