1993
DOI: 10.1063/1.355017
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Shock wave analysis of laser assisted particle removal

Abstract: Laser assisted particle removal (LAPR) is an innovative laser cleaning technique which can remove various particles from solid surfaces via laser induced explosive evaporation of a chosen energy transfer medium, e.g., water. An Ar+ ion continuous-wave laser (488 nm) was used to study the CO2 laser pumped explosive evaporation of water adsorbed on a Si substrate. The probe laser beam was parallel to the sample surface at different displacements and interacted with the ejected material upon pulsed CO2 laser irra… Show more

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Cited by 43 publications
(13 citation statements)
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“…A shock wave created by the laser-induced explosive evaporation of a thin liquid layer was observed in Ref. 10, however the influence of the shock wave on the size of the cleaned area was not studied.…”
Section: A Traditional and Laser Techniques For Surface Cleaning Andmentioning
confidence: 97%
See 2 more Smart Citations
“…A shock wave created by the laser-induced explosive evaporation of a thin liquid layer was observed in Ref. 10, however the influence of the shock wave on the size of the cleaned area was not studied.…”
Section: A Traditional and Laser Techniques For Surface Cleaning Andmentioning
confidence: 97%
“…Some of them 4,5,[7][8][9][10][11][12] are wet techniques and are based on the deposition of a thin liquid film on the surface, with the subsequent explosive evaporation of the adsorbed film by laser heating. Such rapid evaporation produces forces, which are larger than the adhesion force, and propel the particles off the substrate.…”
Section: A Traditional and Laser Techniques For Surface Cleaning Andmentioning
confidence: 99%
See 1 more Smart Citation
“…Thus far, many particle removal methods are advanced out including supersonic cleaning, brush scrub, CMP, supercritical carbon dioxide, laser cleaning. [3][4][5][6][7] Dry cleaning patterns are more hopeful compared with wet cleaning due to its limits such as re-contaminates from chemicals and solvents, rinsing/drying difficulties and incompatibility with other cleaning processes. Laser dry cleaning has been compressively studied and demonstrated as an effective method for particle removal [8][9][10] .…”
Section: Introductionmentioning
confidence: 99%
“…The IC miniaturization requires increasing efforts and new concepts to clean wafer surface. Recently, laser cleaning comes up to be a potential efficient method to remove particles from solid substrates [1][2][3][4][5][6][7][8].…”
Section: Introductionmentioning
confidence: 99%