Short-focus silicon parabolic lenses for hard X-rays

Refractive x-ray optics: step from focusing to interferometric devices

“…Interference maxims will occur at angles defined by a condition (9) Using real part of refraction decrement (9) may be rewritten (10) Directions on maximum of m-th order is defined by relation (11) It is convenient to introduce according [11] the π-shift length δ λ π = / and ratio π χ / K = . Than (11) rewrites to (12) Angle distance between adjacent maxims…”

“…Spectral resolution of echelon is determined by number of steps involved in the refraction profile N max [4] PD[ 1 = ∆ λ λ (15) Derived equations and especially obtained form for transmission function may be used for applications of computer simulation techniques developed earlier [10][11][12].…”

“…X-ray versions of Michelson echelon can be realized in the planar geometry (Fig.8) using modern precise lithography techniques as planar refractive lenses [10][11][12][13]. Calculated features for echelon having steps dimensions P V µ = , P K µ = are given in Table 1.…”

“…Planar microelectronics techniques were previously used for creation of the X-ray refractive elements, and parabolic lenses with a minimized absorption [10][11][12] were created with their help. Optimised set of silicon planar parabolic lenses devoted for hard radiation with the energies up to 100 keV focusing in a linear or point focal spot was also developed [13].…”

“…make Here a possibility may mentioned for decreasing absorption effects by propose earlier[10] procedure of creation refractive kinoform profiles.Realization X-ray version of echelon encounter also technological limitations, between them the value of exposition field = must be taken into account firstly. Up-to-date lithographic plants have the typical data = 100 mm (10 km).…”