Si/Al2O3/ZnO:Al capacitor arrays formed in electrochemically etched porous Si by atomic layer deposition

Macroporous Silicon: Technology and Applications

“…Other surface treatments have been proposed depending on the application. For example, using the atomic-layer deposition (ALD) method, it is possible to cover the walls of a MPS structure conformally with materials such as alumina (Al 2 O 3 ), titania (TiO 2 ) or tantalum oxide (Ta 2 O 5 ), which have applications in sensing devices [43] and electronic devices [44]. Other surface treatments of great interest for energy applications or chemical reactors are the deposition of nanoporous materials like zeolites [45] and catalysts like cobalt, platinum or palladium [12,16].…”

Atomic Layer Deposition

“…Potential applications in the field of nanotechnology are numerous. Other nanostructured objects coated with ALD include porous silicon (153,154), porous anodic alumina films (155,156), aerogels (157), and synthetic opal (123)(124)(125). The research efforts have expanded rapidly due to the fact that ALD by its characteristic features, like perfect conformality and accurate thickness control, is an ideal tool for nanotechnology.…”

Electrochemical Characteristics of Carbonaceous Materials for Energy Storable Electrode Fabrication

“…These capacitors are commercialized and used with active carbon as the main electrode material for both anode and cathode with solid/liquid electrolytes. Many researchers try to improve the performance of these electrochemical capacitors by modifying the electrode construction or materials [4][5][6][7][8][9][10]. Recently, Miyasaka et al [11,12] have reported Grätzel-celltype photocapacitors.…”