Si Microstructure Fabricated by 355 nm Nanosecond Pulsed Laser and Its Fluorescence Microscopy Study

Chunyang, 刘春阳 Liu; Lidong, 孙立东 Sun; Xing, 傅星 Fu; Fengming, 孙凤鸣 Sun; Chunguang, 胡春光 Hu; Zeppenfeld, P.; Xiaotang, 胡小唐 Hu

doi:10.3788/cjl20103708.2139

中国激光

2010

DOI: 10.3788/cjl20103708.2139

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Si Microstructure Fabricated by 355 nm Nanosecond Pulsed Laser and Its Fluorescence Microscopy Study

刘春阳 Liu Chunyang¹,

孙立东 Sun Lidong²,

傅星 Fu Xing³

et al.

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2014

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Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser

Liu

Sui

et al. 2014

AIP Advances

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A pulsed laser fabrication method is used to prepare fluorescent microstructures on silicon substrates in this paper. A 355 nm nanosecond pulsed laser micromachining system was designed, and the performance was verified and optimized. Fluorescence microscopy was used to analyze the photoluminescence of the microstructures which were formed using the pulsed laser processing technique. Photoluminescence spectra of the microstructure reveal a peak emission around 500 nm, from 370 nm laser irradiation. The light intensity also shows an exponential decay with irradiation time, which is similar to attenuation processes seen in porous silicon. The surface morphology and chemical composition of the microstructure in the fabricated region was also analyzed with multifunction scanning electron microscopy. Spherical particles are produced with diameters around 100 nm. The structure is compared with porous silicon. It is likely that these nanoparticles act as luminescence recombination centers on the silicon surface. The small diameter of the particles modifies the band gap of silicon by quantum confinement effects. Electron-hole pairs recombine and the fluorescence emission shifts into the visible range. The chemical elements of the processed region are also changed during the interaction between laser and silicon. Oxidation and carbonization play an important role in the enhancement of fluorescence emission.

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Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser

Liu

Sui

et al. 2014

AIP Advances

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show abstract

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Si Microstructure Fabricated by 355 nm Nanosecond Pulsed Laser and Its Fluorescence Microscopy Study

Cited by 1 publication

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Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser

Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser

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