1991
DOI: 10.1109/23.124081
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Si-SiO/sub 2/ interface state generation during X-ray irradiation and during post-irradiation exposure to a hydrogen ambient (MOSFET)

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Cited by 71 publications
(27 citation statements)
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“…In addition, a hydrogen molecule can diffuse into a positively charged, puckered oxygen vacancy site and dissociate through the same reaction [96]. In this regard, Mrstik and Rendell [97] previously discarded oxygen vacancies as cracking sites at room temperature because "only about 25% of the oxide trapped charge formed during irradiation is removed even after very long exposure to hydrogen at room temperature." However, DFT calculations by Lu et al [3], [93] demonstrated that 80% of all oxygen vacancies in amorphous remain unpuckered upon hole capture.…”
Section: Eldrs In Bipolar Devices and Icsmentioning
confidence: 99%
“…In addition, a hydrogen molecule can diffuse into a positively charged, puckered oxygen vacancy site and dissociate through the same reaction [96]. In this regard, Mrstik and Rendell [97] previously discarded oxygen vacancies as cracking sites at room temperature because "only about 25% of the oxide trapped charge formed during irradiation is removed even after very long exposure to hydrogen at room temperature." However, DFT calculations by Lu et al [3], [93] demonstrated that 80% of all oxygen vacancies in amorphous remain unpuckered upon hole capture.…”
Section: Eldrs In Bipolar Devices and Icsmentioning
confidence: 99%
“…510 [11,15,16]. Експериментальні дані [15,17] свід-чать про багатофакторну участь водню у фор-муванні властивостей Si та SiO 2 .…”
Section: б п команunclassified
“…510 [11,15,16]. Експериментальні дані [15,17] свід-чать про багатофакторну участь водню у фор-муванні властивостей Si та SiO 2 . Однак, якщо для монокристалів Si ситуація вважається в достатніх межах зрозумілою [18], то участь водню у явищах переносу в SiO 2 та Si-SiO 2 є далека від розуміння.…”
Section: б п команunclassified
“…[12]. Experiments have shown that under a positive field nearly all the + H produced in the oxide is ultimately converted to interface traps [13] [14].…”
Section: Model For Dose Rate Sensitivity Of Trapped Chargementioning
confidence: 99%