2006
DOI: 10.1109/tmag.2006.883836
|View full text |Cite
|
Sign up to set email alerts
|

Side-Track Erasure Processes in Perpendicular Recording

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
3
0

Year Published

2007
2007
2014
2014

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 8 publications
(3 citation statements)
references
References 7 publications
0
3
0
Order By: Relevance
“…The second type of erasure reported in [156] occurs far away from the write pole itself [169][170][171][172]. This phenomenon has been named WATER (wide area track erasure) or STE (side-track erasure).…”
Section: A Problem 1: 'Media Relaxation'mentioning
confidence: 99%
“…The second type of erasure reported in [156] occurs far away from the write pole itself [169][170][171][172]. This phenomenon has been named WATER (wide area track erasure) or STE (side-track erasure).…”
Section: A Problem 1: 'Media Relaxation'mentioning
confidence: 99%
“…3) Far-Track Erasure: Far track erasure has previously been reported on single pole heads with a return shield and on a trailing shielded write head [8]. In both cases, the erasure locations can be up to several micrometers away from the MP, which are associated with the shields.…”
Section: ) Ss Corner/edge Erasurementioning
confidence: 99%
“…On the other hand, far-track erasure in the presence of SS is usually caused by the domain wall activities in the shields, which could result from any structural, Manuscript geometrical, and materials property mismatches, defects or imperfections. In this case, the root cause of the far-track erasure could be similar to the side track erasure for a non-SS writer [8], yet the SS added additional complexity to the head structure and to the fabrication processes, which in turn could cause SS-unique far-track erasure problem.…”
Section: Introductionmentioning
confidence: 99%