Sidewall resistance reduction for FinFETs by B&lt;inf&gt;2&lt;/inf&gt;H&lt;inf&gt;6&lt;/inf&gt;/Helium Self-Regulatory Plasma Doping process

Sasaki, Y.

doi:10.1109/iwjt.2010.5474972

2010 International Workshop on Junction Technology Extended Abstracts 2010

DOI: 10.1109/iwjt.2010.5474972

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Sidewall resistance reduction for FinFETs by B<inf>2</inf>H<inf>6</inf>/Helium Self-Regulatory Plasma Doping process

Y. Sasaki¹

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Sidewall resistance reduction for FinFETs by B<inf>2</inf>H<inf>6</inf>/Helium Self-Regulatory Plasma Doping process

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References 6 publications

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