2010
DOI: 10.1557/proc-1258-p05-05
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SiGe Nanowires Grown by LPCVD: Morphological and Structural Analysis

Abstract: SiGe nanowires were grown by the vapor-liquid-solid method using a low pressure chemical vapor deposition reactor and different flows of the GeH 4 and Si 2 H 6 gas precursors. The morphology of the nanowires was studied by field emission scanning electron microscopy, and the length, diameter and density of nanowires were determined. Their structure and crystallinity were analyzed by transmission electron microscopy and its related techniques. Energy dispersive X-ray emission of individual nanowires as well a R… Show more

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Cited by 5 publications
(7 citation statements)
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“…The Si NWs had been synthesized by the LPCVD technique at 400 °C for 30 minutes using Si 2 H 6 as precursor gas, with a flow ranging from 8 to 2 sccm. The H 2 flow was changed to achieve a total flow rate of 100 sccm and the total pressure was kept constant at 400 mTorr 14 .…”
Section: Methodsmentioning
confidence: 99%
“…The Si NWs had been synthesized by the LPCVD technique at 400 °C for 30 minutes using Si 2 H 6 as precursor gas, with a flow ranging from 8 to 2 sccm. The H 2 flow was changed to achieve a total flow rate of 100 sccm and the total pressure was kept constant at 400 mTorr 14 .…”
Section: Methodsmentioning
confidence: 99%
“…Either SiH 4 or Si 2 H 6 and GeH 4 were used as precursor gases, and Au metal droplets were used as catalysts. 21 Single Si NWs were grown at 470 C using Si 2 H 6 as a precursor, while the SiGe NWs (with a nominal Ge atomic fraction close to 0.1) were grown at 430 C. The carrier gas was H 2 , preserving for the different precursor flow ratios a total pressure of 400 mTorr all over the growth run. 21 Under these growth conditions, straight NWs with uniform diameters ranging from 30 to 100 nm were obtained.…”
Section: Experimental and Samplesmentioning
confidence: 99%
“…21 Single Si NWs were grown at 470 C using Si 2 H 6 as a precursor, while the SiGe NWs (with a nominal Ge atomic fraction close to 0.1) were grown at 430 C. The carrier gas was H 2 , preserving for the different precursor flow ratios a total pressure of 400 mTorr all over the growth run. 21 Under these growth conditions, straight NWs with uniform diameters ranging from 30 to 100 nm were obtained. A crucial issue concerns the HJ; in a previous work, the different growth approaches followed to achieve the matching between the SiGe and Si segments in the axially heterostructured NWs were discussed.…”
Section: Experimental and Samplesmentioning
confidence: 99%
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“…The as-grown NWs were sonicated in an ultrasonic bath and suspended in methanol; subsequently the NWs were deposited on an Al substrate by dropcasting. For more details onthe growth of these NWs see [21] and [22]. High resolution transmission electron microscopy (TEM) and energy dispersive x-ray (EDX) analyses of the HJ werecarried out.…”
Section: Experimental Description and Samplesmentioning
confidence: 99%