2015
DOI: 10.1109/tvlsi.2014.2309114
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Signature Driven Hierarchical Post-Manufacture Tuning of RF Systems for Performance and Power

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Cited by 8 publications
(1 citation statement)
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“…Continuous process scaling has led to a large increase in process, voltage, and temperature (PVT) variability and a wide spread fluctuation in integrated circuit (IC) performance. This increasing variability brings significant impact on the parametric yield of today's chip design (Mani et al, 2005;Radfar and Singh, 2014;Banerjee and Chatterjee, 2015). To be specific, 30% variation in effective channel length could cause over 20× fluctuation in leakage power (Rao et al, 2004a;Kanj et al, 2010).…”
Section: Introductionmentioning
confidence: 99%
“…Continuous process scaling has led to a large increase in process, voltage, and temperature (PVT) variability and a wide spread fluctuation in integrated circuit (IC) performance. This increasing variability brings significant impact on the parametric yield of today's chip design (Mani et al, 2005;Radfar and Singh, 2014;Banerjee and Chatterjee, 2015). To be specific, 30% variation in effective channel length could cause over 20× fluctuation in leakage power (Rao et al, 2004a;Kanj et al, 2010).…”
Section: Introductionmentioning
confidence: 99%