“…29 The change in R ions is unlikely to affect intrinsically as well as for bulk. These films are fabricated on various substrates: Al 2 O 3 (001), 18,21,25,26,28 YSZ(111), 17,19,24,27 ZnO(001), 29 MgO(111), 20,22,23 MgAl2O4(111) 23 and 6H-SiC(001). 23 Also various deposition techniques are tried: pulsed laser deposition (PLD), 17,18,20,21,24,27,29 electron beam deposition (EB), 19,25,26 molecular beam epitaxy (MBE), 22,23 and rf magnetron sputtering.…”