2023
DOI: 10.1038/s41598-023-27669-2
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Significant Hall–Petch effect in micro-nanocrystalline electroplated copper controlled by SPS concentration

Abstract: Electroplated Cu has been extensively applied in advanced electronic packaging, and its mechanical properties are critical for reliability. In this study, Cu foils fabricated through electroplating with various bis-(3-sulfopropyl) disulfide (SPS) concentrations are examined using tensile tests. The SPS concentration affects the grain size of the electroplated Cu foils, resulting in different mechanical properties. A significant Hall–Petch effect, $${\sigma }_{y} = 197.4 + 0.12{d}^{\frac{-1}{2}}$$ … Show more

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Cited by 13 publications
(3 citation statements)
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“…The Hall-Petch relationship is usually used to determine the relationship between hardness and crystallite size [59][60][61][62]. Regarding crystallite size values, deformation mechanisms in polycrystalline copper can be categorized into three groups: (1) grain shearing and pile-up at grain borders (grain size greater than or equal to 100 nm); (2) shockley (or lattice) partial dislocations (grain sizes between 10 and 100 nm); and (3) grain boundary sliding (grain sizes less than around 10 nm) [59].…”
Section: Discussionmentioning
confidence: 99%
“…The Hall-Petch relationship is usually used to determine the relationship between hardness and crystallite size [59][60][61][62]. Regarding crystallite size values, deformation mechanisms in polycrystalline copper can be categorized into three groups: (1) grain shearing and pile-up at grain borders (grain size greater than or equal to 100 nm); (2) shockley (or lattice) partial dislocations (grain sizes between 10 and 100 nm); and (3) grain boundary sliding (grain sizes less than around 10 nm) [59].…”
Section: Discussionmentioning
confidence: 99%
“…The surface profiles of the two Cu electroplated layers were also analyzed using a profilometer, as shown in Figure 1c,d, and the results were consistent with the top-view SEM observations. Such a significant morphological change is attributed to the synergistic effect generated by the interactions between the suppressor and accelerator molecules being simultaneously adsorbed on the Cu surface, which regulates the atomic deposition [29,[32][33][34]. The grain size distribution was not uniform in the two Cu electroplated layers, as shown in Figure 2c,d.…”
Section: Effects Of Additives On Co-deposition Of Impurities In Elect...mentioning
confidence: 99%
“…Nanocrystalline copper can also achieve Cu-Cu direct bonding to obtain a high-strength bonding interface. [23][24][25] Therefore, three types of copper, including copper with equiaxed grains (EG Cu), copper with columnar nanotwinned grains (C-NT Cu), and copper with mixed equiaxed and columnar grains (MG Cu), were chosen as the main objects of this study. They were electroplated on the patterns of pads and RDLs in a series of dimensions to study their size sensitivity.…”
Section: Introductionmentioning
confidence: 99%