Conformal
chemical vapor deposition (CVD) of silicon carbide (SiC)
from methyltrichlorosilane (MTS) and hydrogen (H2) onto
high-aspect-ratio (HAR; typically >100:1) three-dimensional features
has been a challenge in the fabrication of ceramic matrix composites.
In this study, the impact of heterogeneous underlayers on the initial
nucleation of SiC-CVD was studied using HAR (1000:1) microchannels
with a tailored wetting underlayer of Si(100) and dewetting underlayers
of thermally formed amorphous silicon dioxide (a-SiO2)
and turbostratic boron nitride (t-BN). Incubation periods were distributed
in the microchannels on a-SiO2 and t-BN underlayers, with
the longest period of 70 min found at the feature-bottom due to a
decreased concentration (C) of film-forming species.
The longer incubation periods with more dewetting underlayers arose
due to demoted initial nucleation. Prolonged incubation at the feature
bottom led to poor conformality because thick films had already formed
at the inlet when film formation began at the feature bottom. The
incubation periods were eliminated by increasing the supply of MTS/H2, in accordance with classical heterogeneous nucleation theory.
In the meantime, carbon-rich SiC films formed in the vicinity of dewetting
a-SiO2 and t-BN underlayers at the feature bottoms, with
greater carbon segregation on more dewetting underlayers. This was
probably due to the deposition of pyrocarbons (CH4, C2H2, and/or C2H4) generated
from MTS/H2 in the gas phase. Decreasing the temperature
(T) from 1000 to 900 °C prevented carbon-rich
film formation, and the expected deposition rate of pyrocarbon decreased
to 0.6% for the case of CH4. A higher C of MTS/H2 combined with a lower T enabled
conformal and stoichiometric film formation on the heterogeneous HAR
features.