2006
DOI: 10.1134/s0021364006090128
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Silicon nanocrystals as photosensitizers of active oxygen for biomedical applications

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Cited by 95 publications
(61 citation statements)
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“…This synthetic method also employs an etching process, combining HF/HNO 3 with sonication to remove the oxide and reduce the size of the particles. Silicon nanoparticles have been proposed as better quantum dots for in vivo applications [20,2] and for photodynamic therapy [25]. While the etching processes described above does not hinder the applications of these nanoparticles, a direct method for preparing hydrogen terminated silicon nanoparticles with less processing would be an improvement.…”
Section: Introductionmentioning
confidence: 99%
“…This synthetic method also employs an etching process, combining HF/HNO 3 with sonication to remove the oxide and reduce the size of the particles. Silicon nanoparticles have been proposed as better quantum dots for in vivo applications [20,2] and for photodynamic therapy [25]. While the etching processes described above does not hinder the applications of these nanoparticles, a direct method for preparing hydrogen terminated silicon nanoparticles with less processing would be an improvement.…”
Section: Introductionmentioning
confidence: 99%
“…First, Si NPs are not only biocompatible12, but also biodegradable as in biological tissue they normally decay into orthosilicic acid Si(OH) 4 , which is naturally excreted from the body through the urine13. Second, due to a series of unique properties, including room temperature photoluminescence1213, singlet oxygen generation under photoexcitation14, infrared radiation–induced15 and ultrasound-induced16 hyperthermia, Si NPs can offer diagnostic1718 and alternative treatment modalities (e.g., Photodynamic Therapy1920) that can be applied in parallel to the RF hyperthermia approach.…”
mentioning
confidence: 99%
“…Two major pathways have been described for their synthesis. Kovalev's method (Timoshenko et al 2006) consists of obtaining silicon nanocrystals using electrochemical etching of silicon wafers in a hydrofluoric acid solution. This treatment led to porous silicon layers which were mechanically milled (ultrasonic bath).…”
Section: Silicon Nanoparticlesmentioning
confidence: 99%