2005
DOI: 10.1016/j.mseb.2005.08.124
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Silicon nanoparticles in thermally annealed thin silicon monoxide films

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Cited by 22 publications
(18 citation statements)
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“…7 (e) is not surprising to have Si nanocrystals in the SiO x layer, which was thicker (15 nm) in this work. It was also reported that Si nanocrystals formed in SiO x film upon annealing at 1000 °C for 30 min were having irregular shapes and the average size of the nanocrystals was reported to be 3 nm [45]. In this work, it is anticipated that the Si nanocrystals formed are having the similar size as the reported one [45] due to the same annealing temperature (1000 °C) and closer annealing time (15 minutes This layer is formed probably due to the interaction between the SiO x layer and La x Ce y O z layer.…”
Section: Resultsmentioning
confidence: 95%
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“…7 (e) is not surprising to have Si nanocrystals in the SiO x layer, which was thicker (15 nm) in this work. It was also reported that Si nanocrystals formed in SiO x film upon annealing at 1000 °C for 30 min were having irregular shapes and the average size of the nanocrystals was reported to be 3 nm [45]. In this work, it is anticipated that the Si nanocrystals formed are having the similar size as the reported one [45] due to the same annealing temperature (1000 °C) and closer annealing time (15 minutes This layer is formed probably due to the interaction between the SiO x layer and La x Ce y O z layer.…”
Section: Resultsmentioning
confidence: 95%
“…8 (a) and (b) where nanocrystals seemed to distribute widely in La x Ce y O z layer. Although the number of Si nanocrystals increases at the expense of SiO x amorphous state with the increment of annealing time, the number is still considerably low [45]. This explained why Si crystalline peaks were not detected by XRD [45].…”
Section: Resultsmentioning
confidence: 99%
“…2b, curve 1). This means that HP applied during the annealing promotes crystallization of silicon nanoparticles in the SiO 2 matrix (compare [1][2][3][4][5][6][7][8]). …”
Section: Originalmentioning
confidence: 99%
“…An origin of the shorter wavelength band is somewhat controversial. According to [4,[8][9][10], this band is related to the emission from amorphous silicon inclusions in the SiO 2 matrix while other authors [11][12][13] have ascribed this emission to various defects present in silicon dioxide. Some authors observed three bands related to the emission from defects and amorphous and crystalline nanoclusters [14].…”
Section: Introductionmentioning
confidence: 99%
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