2009
DOI: 10.1039/b820559k
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Silicon nanowires terminated with methyl functionalities exhibit stronger Si–C bonds than equivalent 2D surfaces

Abstract: Silicon nanowires (Si NWs) terminated with methyl functionalities exhibit higher oxidation resistance under ambient conditions than equivalent 2D Si(100) and 2D Si(111) surfaces having similar or 10-20% higher initial coverage. The kinetics of methyl adsorption as well as complementary surface analysis by XPS and ToF SIMS attribute this difference to the formation of stronger Si-C bonds on Si NWs, as compared to 2D Si surfaces. This finding offers the possibility of functionalising Si NWs with minimum effect o… Show more

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Cited by 77 publications
(64 citation statements)
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“…Figure 2 shows X‐ray photoelectron spectroscopy (XPS) data from the C1s emission region of molecule‐terminated 2D Si(111) samples, fitted to three peaks: CSi at 284.11 ± 0.02 eV, CC at 285.20 ± 0.02 eV, and CO at 286.69 ± 0.02 eV. The peaks were typically adjusted to produce fits that minimized the difference between the full width at half‐maximum (FWHM) 29–32. The center‐to‐center distances were fixed at 1.10 ± 0.10 eV between the CSi and the CC emissions and at 2.60 ± 0.10 eV between the CO and the CSi emissions.…”
Section: Resultsmentioning
confidence: 99%
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“…Figure 2 shows X‐ray photoelectron spectroscopy (XPS) data from the C1s emission region of molecule‐terminated 2D Si(111) samples, fitted to three peaks: CSi at 284.11 ± 0.02 eV, CC at 285.20 ± 0.02 eV, and CO at 286.69 ± 0.02 eV. The peaks were typically adjusted to produce fits that minimized the difference between the full width at half‐maximum (FWHM) 29–32. The center‐to‐center distances were fixed at 1.10 ± 0.10 eV between the CSi and the CC emissions and at 2.60 ± 0.10 eV between the CO and the CSi emissions.…”
Section: Resultsmentioning
confidence: 99%
“…Si NWs tend to form a layer of SiO 2 with thickness 1–2 nm under ambient conditions, and subsequent HF treatment can be used to remove this oxide layer. Different Si surface treatments can be performed and it is also energetically favorable to passivate Si NW surfaces with organic functionalities 29–32. However, the electrical effects of surface chemical modification of Si NW electronic structure have not been systematically investigated.…”
Section: Introductionmentioning
confidence: 99%
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“…Because of the high surface to volume ratio, Si NWs’ properties depend firmly on their surface conditions and surface terminations, in particular. The oxidation of Si NWs, when exposed to ambient air, is believed to have a detrimental effect on their electrical properties due to the low quality of the oxide, giving rise to the uncontrolled interface states and enhanced carrier recombination rates [2]. This necessitates protection of Si NWs’ surfaces against oxidation via termination by various chemical moieties (i.e., alkyls and alkenyls) [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…This effect is enhanced in thin NWs and, as described in our previous report, nanoparticles can accelerate the oxidation on NWs [45]. The higher stability of the 2D(111) relative to the 2D(100) structure is understandable since it naturally has a 15-20% higher coverage than the 2D(100) case [46].…”
Section: Integration Of Hybrid Si Nw Into Solar Cellsmentioning
confidence: 75%