2018
DOI: 10.1002/admi.201801416
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Silicon Oxide‐Rich Diamond‐Like Carbon: A Conformal, Ultrasmooth Thin Film Material with High Thermo‐Oxidative Stability

Abstract: Silicon oxide‐containing diamond‐like carbon (a‐C:H:Si:O) films are a promising class of protective coatings for environmentally‐demanding applications owing to their lower residual stresses and superior thermal stability and oxidation resistance relative to undoped diamond‐like carbon. However, existing versions of a‐C:H:Si:O deposited by traditional methods such as plasma‐enhanced chemical vapor deposition (PECVD) undergo substantial degradation and oxidation at temperatures above 250 °C. This, together with… Show more

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Cited by 15 publications
(6 citation statements)
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“…[37] Sliding tests were performed on an a-C:H:Si:O lm custom-grown by NCD Technologies (Madison, WI) on a Si wafer using the plasma immersion ion implantation and deposition method, as described previously . [22] The RMS roughness of the a-C:H:Si:O was 0.16 nm across 1x1 µm 2 , as measured with AFM. [22] AFM measurements were conducted in either dry nitrogen (< 5% RH) or humid nitrogen (50 ± 5%RH), controlled by continuous ow of nitrogen from the boiloff of a liquid nitrogen dewar, with some fraction bubbled through deionized water to provide humidity when needed.…”
Section: Experimental Methodologymentioning
confidence: 83%
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“…[37] Sliding tests were performed on an a-C:H:Si:O lm custom-grown by NCD Technologies (Madison, WI) on a Si wafer using the plasma immersion ion implantation and deposition method, as described previously . [22] The RMS roughness of the a-C:H:Si:O was 0.16 nm across 1x1 µm 2 , as measured with AFM. [22] AFM measurements were conducted in either dry nitrogen (< 5% RH) or humid nitrogen (50 ± 5%RH), controlled by continuous ow of nitrogen from the boiloff of a liquid nitrogen dewar, with some fraction bubbled through deionized water to provide humidity when needed.…”
Section: Experimental Methodologymentioning
confidence: 83%
“…[22] The RMS roughness of the a-C:H:Si:O was 0.16 nm across 1x1 µm 2 , as measured with AFM. [22] AFM measurements were conducted in either dry nitrogen (< 5% RH) or humid nitrogen (50 ± 5%RH), controlled by continuous ow of nitrogen from the boiloff of a liquid nitrogen dewar, with some fraction bubbled through deionized water to provide humidity when needed.…”
Section: Experimental Methodologymentioning
confidence: 83%
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“…DLC (diamond-like carbon) film is a kind of the functional coating in the applications of tribology, electronics, chemics, etc. [1][2][3][4][5]. In the infrared field, the hard DLC film can be also used as the protective and anti-reflective film [6][7][8][9], because of its low optical absorption in the MIR (medium infrared) band of 3∼5 μm.…”
Section: Introductionmentioning
confidence: 99%
“…Silicon oxide (silica) phases, SiO x have a surprisingly diverse application area including electronics, photovoltaics, medicine, and house construction . For example, SiO x is a constituent of cement, glass, medicines, toothpaste, transistors, and solar cells.…”
Section: Introductionmentioning
confidence: 99%