Silicon oxynitride based scratch resistant anti-reflective coatings

Wang, Jue; Bouchard, Jean; Hart, Gary A.; Oudard, Jean Francois; Paulson, C. A.; Sachenik, P.A.; Price, James J.

doi:10.1117/12.2303679

Cited by 4 publications

(8 citation statements)

References 5 publications

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“…Wavelength-selective, high-hardness coatings were designed using optical transfer matrix simulations [1], incorporating optical properties measured by spectroscopic ellipsometry for the experimentally fabricated coating materials. Coatings were made using reactive sputtering deposition processes [18][19][20][21][22][23][24]. These sputtering fabrication processes have been found to deliver desirable combinations of coating density, stress, hardness, optical absorption, layer thickness control, and deposition rates, enabling the efficient manufacturing of such coatings.…”

Section: Methodsmentioning

confidence: 99%

Wavelength-Selective Coatings on Glass with High Hardness and Damage Resistance

et al. 2020

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Wavelength-selective coatings are broadly applied across diverse industries such as solar energy management, infrared sensing, telecommunications, laser optics, and eye-protective lenses. These coatings have historically not been optimized for hardness or mechanical durability and typically suffer from higher susceptibility to scratch and damage events than uncoated glass. In this work, we describe a family of wavelength-selective coatings with hardness and scratch resistance that are significantly higher than the chemically strengthened glass substrates on which the coatings are fabricated. The coatings are made using industrially scalable reactive sputtering methods. Wavelength-selective coatings are fabricated with nanoindentation hardness as high as 16–20 GPa over indentation depths ranging from 200 to 800 nm, as well as excellent durability in aggressive scratch testing. Tunable visible to near-infrared wavelength selectivity ratios (reflectance of stopband: reflectance of passband) as high as 7:1 are achieved. The feasibility of narrowband hard coating design is also demonstrated, with visible narrowband transmission having a peak FWHM of ~8 nm (~1.6%). A unique “buried layers” hard coating design strategy is shown to deliver particularly excellent hardness profiles. These designs can be tailored for a variety of different wavelengths and selectivity ratios, enabling new uses of wavelength-selective optics in mechanically demanding applications.

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Section: Methodsmentioning

confidence: 99%

Wavelength-Selective Coatings on Glass with High Hardness and Damage Resistance

et al. 2020

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“…Anti-reflective, high-hardness coatings were designed using optical transfer matrix simulations [1], incorporating optical properties measured by spectroscopic ellipsometry for the experimentally fabricated coating materials. Coatings were made using reactive sputtering deposition processes [17][18][19][20]. These sputtering fabrication processes have been found to deliver desirable combinations of coating density, stress, hardness, optical absorption, layer thickness control, and deposition rates, enabling efficient manufacturing.…”

Section: Coating Design and Fabricationmentioning

confidence: 99%

“…As an exemplary process, high hardness, high optical transparency SiOxNy film materials can be deposited by reactive magnetron sputtering from a silicon target [17,18]. Using a laboratory deposition chamber (ATC-2200 with A330-XP UHV magnetron sputtering source from AJA International (N. Scituate, MA, USA)) with 3″ sputtering targets, example process conditions for SiOxNy deposition on glass substrates included 400 W RF power to the Si target supplied at 13.56 MHz, 30 sccm Ar gas flow, 40 sccm N2 gas flow, 0.4 sccm O2 gas flow, 1.5 mTorr process pressure, and a deposition temperature of 100-200 °C.…”

Section: Coating Design and Fabricationmentioning

confidence: 99%

Nanoindentation Hardness and Practical Scratch Resistance in Mechanically Tunable Anti-Reflection Coatings

Price

Zhang

et al. 2021

Coatings

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This work presents fundamental understanding of the correlation between nanoindentation hardness and practical scratch resistance for mechanically tunable anti-reflective (AR) hardcoatings. These coatings exhibit a unique design freedom, allowing quasi-continuous variation in the thickness of a central hardcoat layer in the multilayer design, with minimal impact on anti-reflective optical performance. This allows detailed study of anti-reflection coating durability based on variations in hardness vs. depth profiles, without the durability results being confounded by variations in optics. Finite element modeling is shown to be a useful tool for the design and analysis of hardness vs. depth profiles in these multilayer films. Using samples fabricated by reactive sputtering, nanoindentation hardness depth profiles were correlated with practical scratch resistance using three different scratch and abrasion test methods, simulating real world scratch events. Scratch depths from these experiments are shown to correlate to scratches observed in the field from consumer electronics devices with chemically strengthened glass covers. For high practical scratch resistance, coating designs with hardness >15 GPa maintained over depths of 200–800 nm were found to be particularly excellent, which is a substantially greater depth of high hardness than can be achieved using previously common AR coating designs.

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“…Optoelectronic integration technology urgently requires high-efficiency and high-intensity luminous materials, and the currently-existing silicon integration technology is utilized to develop high-performance optoelectronic devices/systems. Previously, the research on PL of porous silicon and nano-scale silicon at room temperature has aroused widespread attention in this field [34,35,36]. However, porous silicon exhibits several disadvantages such as degradation and poor stability, and it is the most important that it isvery difficult to use it on standard CMOS circuits, thin film sensors, or flexible substrates [37,38].…”

Section: Performance Of Sinxoy Filmmentioning

confidence: 99%

“…Except the tunable refractive index, SiN x O y also has adjustable thin film stress [25] and exhibits photoluminescence (PL) in the visible light range at room temperature [26]. Thus, SiN x O y is highly attractive in integrated circuits (IC) [27], barrier layers [28,29], non-volatile memory [30], optical waveguides [31], organic light emitting diode (OLED) [32], and anti-scratch coatings [33,34]. This review presents a discussion and summary of the preparation methods, performance, and applications of SiN x O y film.…”

Section: Introductionmentioning

confidence: 99%

A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

Shi

Guang

et al. 2019

Micromachines

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Silicon oxynitride (SiNxOy) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiNxOy film. In particular, the preparation of SiNxOy film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.

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Silicon oxynitride based scratch resistant anti-reflective coatings

Cited by 4 publications

References 5 publications

Wavelength-Selective Coatings on Glass with High Hardness and Damage Resistance

Wavelength-Selective Coatings on Glass with High Hardness and Damage Resistance

Nanoindentation Hardness and Practical Scratch Resistance in Mechanically Tunable Anti-Reflection Coatings

A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

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