2020
DOI: 10.1016/j.mssp.2020.105113
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Silicon quantum dot/black silicon hybrid nanostructure for broadband reflection reduction

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Cited by 9 publications
(2 citation statements)
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“…It was reported that the addition of Zn powder to the electrolyte during the electrochemical etching could produce ZnO on the surface of SiQDs. The structure of the compound semiconductor is core and shell; the wider bandgap semiconductor (shell) acts as a potential barrier for the narrower bandgap (core) [34,35]. However, the production of Zn-O and Si-O-Zn can demonstrate that Zn +2 ions were successfully doped into the inner SiQDs layer and that the SiQDs layer was fully coated [35].…”
Section: Morphology and Structure Of Znpsimentioning
confidence: 99%
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“…It was reported that the addition of Zn powder to the electrolyte during the electrochemical etching could produce ZnO on the surface of SiQDs. The structure of the compound semiconductor is core and shell; the wider bandgap semiconductor (shell) acts as a potential barrier for the narrower bandgap (core) [34,35]. However, the production of Zn-O and Si-O-Zn can demonstrate that Zn +2 ions were successfully doped into the inner SiQDs layer and that the SiQDs layer was fully coated [35].…”
Section: Morphology and Structure Of Znpsimentioning
confidence: 99%
“…The structure of the compound semiconductor is core and shell; the wider bandgap semiconductor (shell) acts as a potential barrier for the narrower bandgap (core) [34,35]. However, the production of Zn-O and Si-O-Zn can demonstrate that Zn +2 ions were successfully doped into the inner SiQDs layer and that the SiQDs layer was fully coated [35]. Figure 5 shows the XPS profiles of the ZnPSi, which verified the presence of elements such as Zn, F, Si, and O.…”
Section: Morphology and Structure Of Znpsimentioning
confidence: 99%