Silver Deposition onto Modified Silicon Substrates

Abstract

Trimethylphosphine(hexafluoroacetylacetonato)silver(I) was used as a precursor to deposit silver onto silicon surfaces. The deposition was performed on silicon-based substrates including silica, H-terminated Si(100), and OH-terminated (oxidized) Si(100). The deposition processes at room temperature and elevated temperature (350 °C) were compared. The successful deposition resulted in nanostructures or nanostructured films as confirmed by atomic force microscopy (AFM) and scanning electron microscopy (SEM) with metallic silver being the majority deposited species as confirmed by X-ray photoelectron spectroscopy (XPS). The reactivity of the precursor depends drastically not only on the temperature of the process but also on the type of substrate. Density functional theory (DFT) was used to explain these differences and to propose the mechanisms for the initial deposition steps.

Enhancement of luminous efficacy of polymer light‐emitting diodes with silver‐nanoparticles by oxygen‐plasma treatment

“…Figure 4 shows XPS spectra of the Ag 3d region after O 2 ‐plasma treatment times of 0 min (Figure 4a), 5 min (Figure 4b), 10 min (Figure 4c), and 15 min (Figure 4d) for AgNPs/ITO. Before O 2 ‐plasma treatment, the position of the Ag 3d 5/2 peak at 368.2 eV indicates the presence of metallic silver (Duan et al, 2017; Seah et al, 1990). The binding energy of Ag 3d 5/2 has shifted to 367.8 eV after O 2 ‐plasma treatment and the recorded peaks are clearly broader, implying the formation of Ag 2 O core‐shell (Duan et al, 2018; Gaarenstroom & Winograd, 1977) and resulting in increasing the mean WF of AgNPs/ITO.…”

The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces

“…The second option for molecular adsorption is via the ligands in the coordination sphere of the CVD/ALD precursor complex, in a physisorbed or weakly bonded precursor state. Despite the fact that at the high temperatures required for CVD or ALD it is nearly impossible to confirm the formation of physisorbed states experimentally, most computational studies identify association as the first step in the surface reactions of CVD/ALD precursors, and the nature of this adduct may indeed determine the surface reaction pathways that follow. − Moreover, straightforward adsorption of the CVD/ALD reactant through the metal center has become a common starting point when describing the chemistry of film growth.…”