2007
DOI: 10.1063/1.2768028
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Silver oxide Schottky contacts on n-type ZnO

Abstract: Related Articles Evolution of polarization and space charges in semiconducting ferroelectrics J. Appl. Phys. 111, 034109 (2012) Spin accumulation created electrically in an n-type germanium channel using Schottky tunnel contacts J. Appl. Phys. 111, 07C503 (2012) Epitaxial Fe(1−x)Gax/GaAs structures via electrochemistry for spintronics applications J. Appl. Phys. 111, 07E502 (2012) Metal contact to graphene nanoribbon Appl. Phys. Lett. 100, 063108 (2012) Cross-linking of a poly(3,4-ethylene dioxythiophene):(pol… Show more

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Cited by 149 publications
(81 citation statements)
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“…Schottky barrier heights for bulk ZnO have been reported in the range from 0.6-0.8 eV. 2,4 We have a higher barrier height because the microscopic dipole contribution to the built-in potential caused by non-ideal interfacial charge transfer is, in general, accommodated in the n-ZnO/n-SiC hetero-junction. 22 The higher ideality factor value obtained is probably caused by the existence of interfacial layers or surface states and also indicates that the transport mechanism is no longer dominated by thermionic emission.…”
Section: Resultsmentioning
confidence: 99%
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“…Schottky barrier heights for bulk ZnO have been reported in the range from 0.6-0.8 eV. 2,4 We have a higher barrier height because the microscopic dipole contribution to the built-in potential caused by non-ideal interfacial charge transfer is, in general, accommodated in the n-ZnO/n-SiC hetero-junction. 22 The higher ideality factor value obtained is probably caused by the existence of interfacial layers or surface states and also indicates that the transport mechanism is no longer dominated by thermionic emission.…”
Section: Resultsmentioning
confidence: 99%
“…14,15 Schottky barrier heights for bulk ZnO have been reported in the range of 0.6-0.8 eV. 2,4 In low-dimensional systems, the Schottky barrier height depends not only on the work function of the metal but also on the pinning of the Fermi level by the surface states, image force lowering of the barrier, field penetration and the existence of an interfacial insulating layer; these effects change the absolute current value at low bias values by lowering the Schottky barrier. 16 Schottky devices can be used to evaluate the different semiconductor parameters, including the carrier density, the Schottky barrier height, the carrier density profile, and the band gap discontinuity.…”
Section: Introductionmentioning
confidence: 99%
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“…SCs can be accomplished by using a simple pre-cleaning of the ZnO samples in organic solvents [62,55], but in many cases the rectifying behavior, or the improved rectification, involves some kind of more advanced surface pretreatment: in oxygen plasma [57,54], in hydrogen peroxide [63,64], or a (NH 4 ) 2 S x solution [65], etching of the surface using HCl [66], or a soak in concentrated H 3 PO 4 followed by a dip in HCl [37]. The use of metal oxides, like AgO, as a contact material seems also to represent a valid alternative; SCs with a high barrier, Φ b ∼ 1 eV, and low ideality factors, n ∼ 1.0 − 1.1, have been obtained in this case [67]. In conclusion, among the different pre-treatments proposed, the H 2 O 2 treatment, the exposure to a remote O 2 /He plasma and the use of AgO seem to be the most promising ones so far regarding the rectifying properties of the SCs.…”
Section: The State Of the Artmentioning
confidence: 99%