2018
DOI: 10.1016/j.surfcoat.2018.01.083
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Simulation and experimental researches on HFCVD diamond film growth on small inner-hole surface of wire-drawing die with no filament through the hole

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Cited by 16 publications
(3 citation statements)
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“…Moreover, compared with the traditional copper holder, the difference with the ceramic one decreases by 54 %. It should be noted that since the permitted substrate temperature should be generally maintained around 600-1000 • C for depositing the polycrystalline diamond films [8,12], too low a thermal conductivity may result in an excessively high substrate temperature that exceeds the permitted values. Fortunately, the substrate temperature is maintained in the permissible range for the three cases.…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…Moreover, compared with the traditional copper holder, the difference with the ceramic one decreases by 54 %. It should be noted that since the permitted substrate temperature should be generally maintained around 600-1000 • C for depositing the polycrystalline diamond films [8,12], too low a thermal conductivity may result in an excessively high substrate temperature that exceeds the permitted values. Fortunately, the substrate temperature is maintained in the permissible range for the three cases.…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
“…Hot filament CVD (HFCVD) is one of the earliest and most mature methods for depositing the diamond films. Compared with other CVD methods, this method has such advantages as simple equipment, easy control of growth process, and being suitable for the high-throughput preparation of CVD diamond coated tools [6][7][8]. For the high-efficiency and high-quality fabrication of the diamond coated tools, especially for tools with a long flute, the uniformity of thickness, grain size, and purity of the CVD diamond coating, is one of the most vital indexes.…”
Section: Introductionmentioning
confidence: 99%
“…are there but among all. The LPCVD is very much popular and preferable technique to produce diamond, due to its excellent purity, uniformity and good step coverage [2]. The level of purity is very high in the LPCVD system as enough vacuum is maintained in the curved chamber (which is about 5-10 Torr).…”
Section: Introductionmentioning
confidence: 99%