Abstract:11This paper presents an investigation of total ionizing dose (TID) induced image lag sources in pinned photodiodes (PPD) CMOS 12image sensors based on radiation experiments and TCAD simulation. The radiation experiments have been carried out at the Cobalt 13 -60 gamma-ray source. The experimental results show the image lag degradation is more and more serious with increasing TID. 14 Combining with the TCAD simulation results, we can confirm that the junction of PPD and transfer gate (TG) is an important regio… Show more
“…6(a)], the transfer before irradiation is limited by the barrier in the middle of the TG and the pixel exhibits very good lag performances when nonirradiated (CTI ∼ 0.05%). After TID of 0.1 kGy(SiO 2 ), the CTI increase is mostly due to the modification of the potential in the PPD-TG interface where a potential pocket is created (simulation of this effect is reported in [6]) as illustrated by the blue line in Fig. 6(a).…”
Section: A Pre Metal Dielectric Oxide Effectmentioning
confidence: 99%
“…However, other parameters deteriorate under irradiation exposure. The charge transfer in PPD CIS can be enhanced or degraded (depending on the limiting lag causes in the nonirradiated device) by the TID-induced-trapped positive charges in the TG spacer vicinity [3], [6]. Moreover, the positive-trapped charges and interface states in the PMD lead to an increase of the pinning voltage, whereas the TIDinduced-trapped charges in the TG STI sidewalls generate a TG subthreshold leakage leading to full well capacity (FWC) reduction [3].…”
The total-ionizing dose (TID) effects on image lag in pinned photodiode CMOS image sensors are investigated thanks to various device variants in order to isolate the major radiationinduced effects on the charge transfer. It is shown that the main cause of the charge transfer degradation is the radiation-induced defects generation in the premetal dielectric (PMD) and in the transfer gate (TG) spacer vicinity which modifies the potential diagram at the photodiode/TG interface by the creation of a potential pocket retaining the electrons that are not transferred. For 0.1 kGy(SiO 2) < TID < 5 kGy(SiO 2), the potential pocket degrades the pixel which exhibits very good lag performances, whereas it improves the high lag pixels by creating a speedup implant enhancing the electron transfer or by reducing the spillback. For TID > 5 kGy(SiO 2), the defects generated in the PMD influence the whole photodiode potential inducing a pinning voltage increase and degrading the charge transfer by enlarging the potential pocket effect which becomes the main image lag source. The reported results clarify the impact of ionizing radiation on the charge transfer, suggesting radiation hardened by design solutions for future space or nuclear applications.
“…6(a)], the transfer before irradiation is limited by the barrier in the middle of the TG and the pixel exhibits very good lag performances when nonirradiated (CTI ∼ 0.05%). After TID of 0.1 kGy(SiO 2 ), the CTI increase is mostly due to the modification of the potential in the PPD-TG interface where a potential pocket is created (simulation of this effect is reported in [6]) as illustrated by the blue line in Fig. 6(a).…”
Section: A Pre Metal Dielectric Oxide Effectmentioning
confidence: 99%
“…However, other parameters deteriorate under irradiation exposure. The charge transfer in PPD CIS can be enhanced or degraded (depending on the limiting lag causes in the nonirradiated device) by the TID-induced-trapped positive charges in the TG spacer vicinity [3], [6]. Moreover, the positive-trapped charges and interface states in the PMD lead to an increase of the pinning voltage, whereas the TIDinduced-trapped charges in the TG STI sidewalls generate a TG subthreshold leakage leading to full well capacity (FWC) reduction [3].…”
The total-ionizing dose (TID) effects on image lag in pinned photodiode CMOS image sensors are investigated thanks to various device variants in order to isolate the major radiationinduced effects on the charge transfer. It is shown that the main cause of the charge transfer degradation is the radiation-induced defects generation in the premetal dielectric (PMD) and in the transfer gate (TG) spacer vicinity which modifies the potential diagram at the photodiode/TG interface by the creation of a potential pocket retaining the electrons that are not transferred. For 0.1 kGy(SiO 2) < TID < 5 kGy(SiO 2), the potential pocket degrades the pixel which exhibits very good lag performances, whereas it improves the high lag pixels by creating a speedup implant enhancing the electron transfer or by reducing the spillback. For TID > 5 kGy(SiO 2), the defects generated in the PMD influence the whole photodiode potential inducing a pinning voltage increase and degrading the charge transfer by enlarging the potential pocket effect which becomes the main image lag source. The reported results clarify the impact of ionizing radiation on the charge transfer, suggesting radiation hardened by design solutions for future space or nuclear applications.
“…At low signal levels image lag is dominated by incomplete transfer of electrons, due to potential barriers or "pockets" in the transfer path 8 . At higher levels of illumination, the main source of lag is charge spill-back 9 , which also has an adverse effect on linearity 10 .…”
2020). Mitigating charge spill-back induced image lag with a multi-level transfer gate pulse in PPD image sensors. In: X-Ray, Optical, and Infrared Detectors for Astronomy IX (Holland, Andrew D. and Beletic, James eds.), Proceedings of SPIE,
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