1995
DOI: 10.1016/0168-583x(94)00576-1
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Simulation of ion implantation in Si for 0.25 keV H+ under channeling conditions

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Cited by 6 publications
(1 citation statement)
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“…7) that the generalized stopping ratio R(v) ≡ S p e (v)/S p e (v) between the experimental antiproton and proton stopping powers in C, Si, and Al targets [20] are equal over a range of antiproton velocities v within the experimental uncertainties. This is because the S e values at low projectile velocities are approximately proportional to the electron density in the target [160,161]. We used the exponential parameterization,…”
Section: B Electronic Stoppingmentioning
confidence: 99%
“…7) that the generalized stopping ratio R(v) ≡ S p e (v)/S p e (v) between the experimental antiproton and proton stopping powers in C, Si, and Al targets [20] are equal over a range of antiproton velocities v within the experimental uncertainties. This is because the S e values at low projectile velocities are approximately proportional to the electron density in the target [160,161]. We used the exponential parameterization,…”
Section: B Electronic Stoppingmentioning
confidence: 99%