Simulation of Magnetorheological Plane Polishing Scratch Creation Process and Suppression Method

Abstract

This study was conducted to simulate the causes of, and suppress, the scratch damage on the workpiece surface during magnetorheological surface polishing. The molecular dynamics method combined with polishing contact trajectory modeling was used to simulate the scratch damage formation process, and the scratch damage morphology model was established by analyzing the scratch damage distribution characteristics in the magnetorheological plane polishing process. The effect of different process parameters on the scratch damage characteristics was predicted by simulation, and orthogonal experiments were designed to explore the preferred polishing process parameters that could suppress the scratch damage formation. Finally, it was further verified that the formation of scratch damage can be effectively suppressed by controlling the workpiece speed, polishing disc speed, and magnetic field generator speed, and adjusting the magnetic field eccentricity distance under the premise of ensuring the surface roughness and flatness of the workpiece.

Synthesis of rGO/CoFe2O4 Composite and Its Magnetorheological Characteristics

“…When H is removed, MR fluids return to a liquid state. The characteristics of MR fluids find application across various engineering domains, such as dampers or shock absorbers [2], polishing [6], vehicle suspension [7,8], biomedical applications [9], soft robots [10], MR electrolytes in batteries [11], and so on. Moreover, the millisecond response time of MR fluids makes them one of the most rapid electromechanical interfaces [12].…”