Simulation of particle transport and deposition in the modified chemical vapor deposition process

Impact of chlorine dissociation for modified chemical vapor deposition

“…Note that details of the different wall temperature profiles used (i.e. single-and multi-pass) are given in [2]. Initial simulations covered cases examined previously for which high gas temperatures were not experienced, and thus the chlorine dissociation/recombination reactions would have only a modest impact.…”

“…In previous modeling studies [1,2], the sole reaction considered was the irreversible oxidation of silicon tetrachloride (SiCl 4 ) [3]. SiCl 4 ðgÞ þ O 2 ðgÞ !…”

“…All other aspects of the CFD modeling of the MCVD system remained the same as in our earlier studies where SiCl 4 oxidation was the only reaction considered [1,2].…”

“…a multi-pass profile with a peak of 2300 K) that had been successfully modeled previously [2] were repeated but now with chlorine dissociation/recombination included in the reaction scheme. The thermal conditions for some chlorine dissociation are reached in both cases (see Fig.…”

Thermophoretic Motion of a Cylindrical Particle with Chemical Reactions

“…Some chemical reactions may occur inside thermophoretic particles in practice (Nguyen et al 2002;Cheung et al 2009;Dang and Swihart 2009). For example, chemical reactions happen in the detrimental combustion soot during its formation, oxidation, and thermophoretic deposition in a diesel engine (Tan et al 2013).…”