Simulation of plasma processes for microelectronic fabrication

Brinkman, Ralf Peter; Kratzer, Matthias; Schmidt, Harald

doi:10.1351/pac199971101863

Cited by 4 publications

(1 citation statement)

References 3 publications

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“…Patterning of solid surfaces with reactive conjugates has found continuous attention, due to broad potential application of those materials for fabrication of optical devices [1], microelectronic materials [2] and biosensors [3]. Among various techniques surface plasmon-modification [4] and ion implantation [5] have been widely used for direct functionalization of solid surfaces with amine or hydroperoxy groups.…”

Section: Introductionmentioning

confidence: 99%

A facile method for generating Michael acceptor thin films via amine substituted poly(vinyl methyl ketone)

Bıçak

2014

Pure and Applied Chemistry

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Alpha-morpholine substituted poly(vinyl methyl ketone) (PVMK) was determined to undergo rapid self-crosslinking by short-term vacuuming (i.e., 30-60 min) or curing at 70-100 °C. The chemical transformations involved were monitored by TGA, DSC, FT-IR, 1 HNMR and solid-state 13 C NMR techniques. These experiments revealed an "unzipping-like" mechanism yielding multi conjugated enone structure via consecutive deamination by β-hydrogen elimination and simultaneous Diels-Alder cyclization resulting in crosslinking. This chemistry was exploited for generating Michael acceptor thin film coatings on silica nanoparticles, in which the silica was impregnated with morpholine substituted poly(vinyl methyl ketone) and simply heated at 100 °C. The dense polyene functional films so formed were demonstrated to add amines and thiols at room temperature. The resulting silica nanoparticles were employed to form homogenous composite films using poly(butyl acrylate-stat-methylmethacrylate) as carrier matrix. Morpholine substituted poly(vinyl methyl ketone) (MSP) seems to be generally applicable for surface modification of different inorganic surfaces with organics.

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Section: Introductionmentioning

confidence: 99%

A facile method for generating Michael acceptor thin films via amine substituted poly(vinyl methyl ketone)

Bıçak

2014

Pure and Applied Chemistry

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A facile and efficient method of enzyme immobilization on silica particles via Michael acceptor film coatings: immobilized catalase in a plug flow reactor

Bayramoğlu

Arıca

Genc

et al. 2016

Bioprocess Biosyst Eng

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A novel method was developed for facile immobilization of enzymes on silica surfaces. Herein, we describe a single-step strategy for generating of reactive double bonds capable of Michael addition on the surfaces of silica particles. This method was based on reactive thin film generation on the surfaces by heating of impregnated self-curable polymer, alpha-morpholine substituted poly(vinyl methyl ketone) p(VMK). The generated double bonds were demonstrated to be an efficient way for rapid incorporation of enzymes via Michael addition. Catalase was used as model enzyme in order to test the effect of immobilization methodology by the reactive film surface through Michael addition reaction. Finally, a plug flow type immobilized enzyme reactor was employed to estimate decomposition rate of hydrogen peroxide. The highly stable enzyme reactor could operate continuously for 120 h at 30 °C with only a loss of about 36 % of its initial activity.

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Ionized physical vapor deposition of titanium nitride: A deposition model

Mao

Hopwood

2004

Journal of Applied Physics

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A model for reactive ionized physical vapor deposition of TiN has been developed to predict film conformality and stoichiometry in a high aspect ratio trench. The two additional model components are a radio-frequency (rf) sheath model for the transport of ions to the wafer surface and a feature-scale deposition model to simulate the thickness and composition of TiNx films in a two-dimensional trench. The feature scale deposition model depends critically on the sticking coefficient for nitrogen atoms on TiNx surfaces since this is the primary method by which the Ti+ that is deposited inside deep trenches becomes nitrided. This sticking coefficient has been experimentally determined as a function of TiNx stoichiometry. The simulation results agree with both experimental observations and intuitive concepts for reactive sputter deposition. Namely, the deposition rates decrease slightly when rf bias is applied to the wafer. This decrease is due to resputtering. The model also predicts a decrease in the nitrogen content of deposited films along the sidewalls of trenches, and nitrogen deficient films at the bottom of trenches under metal-mode deposition conditions. The model’s accuracy is verified by measuring the thin film characteristics, especially deposition rate, step coverage, and composition. The deposition model gives an accurate prediction of composition ratio. The deposition model also predicts the deposition rate and step coverage accurately if no bias voltage is applied to the wafer. Although the bottom coverage and the deposition rate are accurately predicted, the sidewall coverage is 30% lower than experimental results for −50 V rf bias. This discrepancy is believed to be due to uncertainties in the angle-dependent sputter yield of TiNx at low ion energy, and the neglect of unthermalized fast neutral Ti atoms.

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Simulation of plasma processes for microelectronic fabrication

Cited by 4 publications

References 3 publications

A facile method for generating Michael acceptor thin films via amine substituted poly(vinyl methyl ketone)

A facile method for generating Michael acceptor thin films via amine substituted poly(vinyl methyl ketone)

A facile and efficient method of enzyme immobilization on silica particles via Michael acceptor film coatings: immobilized catalase in a plug flow reactor

Ionized physical vapor deposition of titanium nitride: A deposition model

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