Simulation of the Time Evolution Profiles in Nanoimprint Lithography

Tanabe, Toshiaki; Nishihata, Masaaki; Kawata, Hiroyuki; Hirai, Yoshihiko

doi:10.2494/photopolymer.20.573

Cited by 2 publications

(3 citation statements)

References 3 publications

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“…One solution to this problem is to visualize the strain distribution by numerical computational study. [26][27][28][29][30][31][32] In this work, the shear strain distribution in a polymer thin film is simulated for various mold patterns, residual polymer thicknesses, and mold surface friction coefficients.…”

Section: Computational Simulation Modelsmentioning

confidence: 99%

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Study on induced strain in direct nanoimprint lithography

Watanabe¹,

Iida²,

Yasuda³

et al. 2018

Jpn. J. Appl. Phys.

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The induced shear strain distribution in a polymer film is investigated by computational study in a direct nanoimprint process. The effects of the polymer thickness, mold pattern shape such as rectangular, triangular or overcut pattern shape, and the coefficient of friction between the mold and the polymer are studied by computational work. As the coefficient of friction increases, the induced shear strain increases along the mold surface. Depending on the polymer thickness, the shear strain is induced in the residual and/or pattern area. In the triangular pattern, the strain is induced in the pattern central area. The results suggest that shear stress remains in the triangular pattern area in the direct nanoimprint process. On the other hand, the rectangular pattern is suitable for suppressing the induced strain inside the pattern.

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Section: Computational Simulation Modelsmentioning

confidence: 99%

“…The friction between the polymer and the mold is assumed to be 0.0 or 0.3. 38,39) In this calculation, the critical shear strain and braking stress are not considered because the polymer is a virtual polymer with viscoelastic characteristics such as PMMA.…”

Section: Computational Simulation Modelsmentioning

confidence: 99%

Study on induced strain in direct nanoimprint lithography

Watanabe¹,

Iida²,

Yasuda³

et al. 2018

Jpn. J. Appl. Phys.

Self Cite

View full text Add to dashboard Cite

show abstract

“…For computational study, conventional Finite Element method is applied [14][15][16][17][18][19][20]. Generalized Maxwell model [21] was used for the polymer model as illustrated in Fig.…”

Section: Computational Modelmentioning

confidence: 99%

Study on Induced Stress and Strain in Direct Nanoimprint Lithography

Iida

Yasuda

Kawata

et al. 2016

J. Photopol. Sci. Technol.

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Induced stress and strains in direct nanoimprint process are investigated by computational works. Impact of the mold pressing velocity, the polymer thickness, and the side wall angle of the mold are studied for the model polymer and PMMA. The shear stress distribution in pattern cavity is strongly affected by the polymer thickness and the side wall angle of the mold. By inclination of the side wall, the shear stress is spread into pattern cavity in triangular shaped cavity due to polymer flow along the side wall, which may induce molecular ordering. On the other hand, stress and strain distributions are hardly affected by the mold pressing velocity under investigated conditions.

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Simulation of the Time Evolution Profiles in Nanoimprint Lithography

Cited by 2 publications

References 3 publications

Study on induced strain in direct nanoimprint lithography

Study on induced strain in direct nanoimprint lithography

Study on Induced Stress and Strain in Direct Nanoimprint Lithography

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