from the resistance of the CSL, and they also reduce the effective area of the ohmic contacts and further aggravate the droop.To mitigate the effects of the resistive losses, Hurni et al. recently showed that increasing the thickness of the n-type CSL leads to significantly less pronounced current crowding and improves the wall-plug efficiency of LEDs at large currents. [8] However, this approach still necessitates using expensive bulk GaN substrates and a part of the active region (AR) needs to be cut out to deposit n-type contacts, exposing the edges of the AR to surface recombination. The basic structure of Hurni's low resistance LEDs as well as essentially all conventional LEDs relies on a double heterojunction (DHJ) design, where electrons and holes are injected to the AR from nand p-doped regions located on the opposite sides of the AR. This sets evident limitations to designing the structures so that the contacts do not substantially decrease the total AR area or increase the free surface area susceptible to surface recombination. To avoid some of the limitations of conventional DHJ structures related to device scaling, resistive losses and electrical excitation in general, diffusion-driven charge transport (DDCT) was very recently introduced as an alternative way to electrically excite the AR of LEDs. [9][10][11][12] In DDCT, the pn junction is partly separated from the AR, and in contrast with conventional solutions it relies on transporting electrons and holes to the AR from the same side by bipolar diffusion, enabling additional degrees of freedom for designing new devices.For practical reasons, the previous works on DDCT have mainly focused on structures containing vertically formed pn-homojunctions, which entail potential barriers and lead to suboptimal device performance. In this paper, however, we show that the electrical inefficiencies observed earlier can be fully eliminated by adapting the DDCT concept to realize laterally doped heterojunction (LHJ) structures (see Figure 1), and that the SAG techniques needed to realize such LHJ devices do not compromise the internal quantum efficiency of the AR. Furthermore, our results show that the LHJ structures can be further engineered using appropriate material composition gradings, that can reduce the resistive heating of the devices even below the limit set by ideal conventional DHJ devices.The fundamental difference between the DHJ and LHJ structures is the placement and geometry of the doped p-and n-GaN charge injection regions, which are expected to mainly affect Gallium nitride based light-emitting diodes (LEDs) are presently fundamentally transforming the lighting industry, but limitations in the materials and fabrication methods of LEDs introduce substantial challenges to their future development. Among the remaining key bottlenecks of GaN LEDs are the resistive losses and current crowding that strongly increase the heat generation at high powers. In this work the authors show how a new design paradigm based on diffusion-driven charge transport (...