Simulation of X-ray diffraction in Mn$_x$Bi$_2$Te$_{3+x}$ epitaxic films

Abstract

Disordered heterostructures stand as a general description for compounds that are part of homologous series such as bismuth chalcogenides. In device engineering, van der Waals epitaxy of these compounds is very promising for applications in spintronic and quantum computing. Structural analysis methods are essential to control and improve their synthesis in the form of thin films. Recently, X-rays tools have been proposed for structural modeling of disordered heterostructures [arxiv.org/abs/2107.12280]. Here, we further evaluate the use of these tools to study the compound Mn x Bi 2 Te 3+x in the grazing incidence region of the reflectivity curves, as well as the effect of thickness fluctuation in the wide angle region.