Simulation study of decoherence and light intensity uniformization for extreme ultraviolet of uniform light pipe
Hui Li,
Fang-Rui Tan,
Hao-Yu Yin
et al.
Abstract:Free Electron Laser (FEL) is a high-quality laser source with wavelengths ranging from short-wave X-rays to long-wave infrared ray. Extreme Ultra-violet (EUV) radiation at λ=13.5nm emitted by FEL can be used in integrated circuit manufacturing, such as EUV lithography exposure, mask defect inspection.However, the high spatial coherence characteristics and similar Gauss intensity profile distribution of FEL source has a negative effect on imaging, and cannot meet the requirements of imaging applications in EUV … Show more
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