2021
DOI: 10.1109/ted.2021.3084578
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Simulation Study of Novel Trench Gate U-Shaped Channel SOI Lateral IGBTs With Suppressed Gate Voltage Overshoot and Reduced di/dt

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Cited by 2 publications
(2 citation statements)
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“…1 (a)), and the displacement current composed of these holes can overcharge gate, resulting in high di/dt and gate overshoot (in Fig. 3 (a)) [7]. As shown in Fig.…”
Section: Structure and Mechanismmentioning
confidence: 94%
See 1 more Smart Citation
“…1 (a)), and the displacement current composed of these holes can overcharge gate, resulting in high di/dt and gate overshoot (in Fig. 3 (a)) [7]. As shown in Fig.…”
Section: Structure and Mechanismmentioning
confidence: 94%
“…Recent years, many novel IGBTs with multiple ports or integrated devices have been reported to improve the carrier controllability in different transients. In the turn-on transient, better dv/dt or di/dt controllability can be achieved by controlling the hole concentration beside gate polysilicon [4], [5] or suppressing the effect of displacement current on gate voltage [6], [7]. In the turn-off transient, fast electron/hole extraction or decreasing stored carriers is crucial to achieve low turn-off loss (E OFF ).…”
Section: Introductionmentioning
confidence: 99%