2023
DOI: 10.1016/j.mee.2023.111965
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Simulation study of zone-height limit by electron beam lithography for 30 nm Fresnel zone plates in X ray optics

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“…Its quality significantly influences the spatial resolution and diffraction efficiency of the imaging system. The optimization of processes and enhancement of the performance of Fresnel zone plates have become focal points of increasing attention among researchers, such as Qiucheng Chen's study on the simulation of photolithography [3] and so on.…”
mentioning
confidence: 99%
“…Its quality significantly influences the spatial resolution and diffraction efficiency of the imaging system. The optimization of processes and enhancement of the performance of Fresnel zone plates have become focal points of increasing attention among researchers, such as Qiucheng Chen's study on the simulation of photolithography [3] and so on.…”
mentioning
confidence: 99%