The Fresnel zone plate plays a pivotal role in X-ray imaging systems, directly influencing the uniformity of imaging contrast. Achieving uniform imaging contrast imposes stringent requirements on the linewidth and height uniformity of the zone plate. The current mainstream method for zone plate fabrication involves utilizing electron beam lithography in conjunction with electroplating. However, in structures with large aspect ratios, precise deposition of gold to the bottom of the trench through electroplating becomes increasingly challenging to control. In this study, we employed a pulse plating process to enhance the uniformity of the plating height. Detailed investigations were conducted to analyze the effects of pulse current density, pulse duty cycle, and pulse frequency on plating height. Utilizing pulse plating, we successfully fabricated a zone plate with an outermost width of 50 nm and a thickness of approximately 245 nm. Structural analysis showed that the plating height uniformity is improved to better than 5%. The high uniformity imaging pattern was obtained by using the Siemens star test pattern at the soft x-ray imaging station at NSRL. The spatial resolution was down to 50 nm.