2014
DOI: 10.1063/1.4873395
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Simultaneous enhancement of electron overflow reduction and hole injection promotion by tailoring the last quantum barrier in InGaN/GaN light-emitting diodes

Abstract: A three-step graded undoped-InGaN layers embedded between the GaN last quantum barrier layer and the p-AlGaN electron blocking layer was proposed and its effect on the performance of InGaN/GaN light-emitting diodes was investigated both experimentally and theoretically. In the proposed structure, the electron leakage is found to be effectively reduced, while the hole injection efficiency is simultaneously increased significantly, hence enabling a greatly enhanced radiative recombination rate within the active … Show more

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Cited by 16 publications
(8 citation statements)
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“…Such different band bending details have been well calculated and can be found in Ref. , and they are now presented in Fig. (a) and (b).…”
Section: Approaches For Improving the Internal Quantum Efficiencysupporting
confidence: 76%
See 1 more Smart Citation
“…Such different band bending details have been well calculated and can be found in Ref. , and they are now presented in Fig. (a) and (b).…”
Section: Approaches For Improving the Internal Quantum Efficiencysupporting
confidence: 76%
“…However, this structure induces the post‐bonding difficulties thus making it less reliable in reality. Some groups suggest inserting a p‐InGaN before growing the p‐AlGaN EBL to reduce the electron leakage , but the origin on the reduced electron leakage is unclear till now. This can nevertheless be well explained by the polarization inversion effect.…”
Section: Approaches For Improving the Internal Quantum Efficiencymentioning
confidence: 99%
“…[16][17][18][19] The significance of using the GaN/InGaN structure as the last quantum barrier to enhance the hole injection has also been presented by several groups. [20][21][22][23][24] Another strategy to improve the hole injection is to increase the hole concentration in the p-GaN layer. The ionization ratio of the Mg doped GaN layer is as low as 1% even after rapid thermal annealing.…”
mentioning
confidence: 99%
“…Our work is beneficial for the understanding of ELO process and the further development of InGaN/GaN heterostructure based devices. C InGaN/GaN multiple-quantum-well structures have already been extensively used in solid-state light emitting diodes (LEDs) and laser diodes (LDs), [1][2][3][4] where the emission wavelength of such devices can desirably be modulated from near ultraviolet to infrared range by adjusting the indium composition of InGaN. With less effect from polarization field, semi-polar devices are attracting more and more attention for the LEDs and LDs.…”
mentioning
confidence: 99%