Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Abstract

Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept has versatility to any block copolymer, it could be employed as next-generation nanolithography.

Sulfonated Poly(ether sulfone)-Coated and -Blended Nafion Membranes with Enhanced Conductivity and Reduced Hydrogen Permeability

“…In particular, a pseudohexagonal morphological peak pattern was observed in sPES-c1-Nafion, in which the q-squared ratios (q/q 0 ) 2 = 1:3:7 when q 0 = 0.8545 Å −1 . 49,50 This morphological pattern was consistent with that obtained from the AFM data (Figure S11b), as previously explained. This result was attributed to the fact that Nafion contains its hydrophilic sulfonic acid groups in the form of side chains, and therefore its conducting groups have better mobility than other polymers such as sPES, in which sulfonic acid groups are introduced in the vicinity of the polymer backbone.…”

Dissipative particle dynamics for directed self-assembly of block copolymers

“…With the advancement of modern technology, intricate designs of nanostructures with nanoscale feature sizes are needed for various applications. Self-assembly of block copolymers (BCPs) offers a feasible route to fabricate such nanopatterns with feature sizes ranging from 5-500nm [1][2][3][4][5][6][7][8][9][10][11] . Block copolymers are comprised of two or more chemically distinct subchains, which are linked together by covalent bonds.…”

Stimuli-Responsive Polymers Providing New Opportunities for Various Applications

“…As seen in Figure 10a, the degradation of the polymeric structure can be achieved by breaking down the lightresponsive groups in the polymer main chain [316][317][318][319][320][321][322][323]. These photo-responsive groups can be located in the end group of the polymer main chain, along the main chain or at the junction of two different blocks of block copolymers.…”