2018
DOI: 10.1016/j.vacuum.2017.10.006
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Simultaneous process of surface modification and sterilization for polystyrene dish

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Cited by 12 publications
(5 citation statements)
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“…In contrast, the contact angle after UV treatment gradually decreased with the treatment time but saturated after 5 min. Basing on this result, the required surface modification may be performed by both plasma and AOS excited by UV lamp 12 . Herein, it was confirmed that the surface after the plasma treatment was more hydrophilic as compared with that after the UV treatment.…”
Section: Resultsmentioning
confidence: 63%
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“…In contrast, the contact angle after UV treatment gradually decreased with the treatment time but saturated after 5 min. Basing on this result, the required surface modification may be performed by both plasma and AOS excited by UV lamp 12 . Herein, it was confirmed that the surface after the plasma treatment was more hydrophilic as compared with that after the UV treatment.…”
Section: Resultsmentioning
confidence: 63%
“…The contact angles after surface modification are presented in and AOS excited by UV lamp. 12 Herein, it was confirmed that the surface after the plasma treatment was more hydrophilic as compared with that after the UV treatment. Enhancement of the adhesion with copper might be expected due to the PEEK surface modification from hydrophobic to hydrophilic state.…”
Section: Resultsmentioning
confidence: 67%
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“…1) AOS exposure leads to microorganism inactivation. 10) In order to establish this technology for use with AOS, determining the presence of AOS and providing an indicator for the sterilization process is necessary; moreover, technology for detecting reactive AOS is highly necessary. However, the measurement methods for AOS in the atmosphere require specialized and expensive equipment, such as an optical laser system 11) and a vacuum ultraviolet (UV) light source; 12,13) furthermore, electron spin resonance spectroscopy, which is method for detecting radicals with short lifetimes, e.g.…”
Section: Introductionmentioning
confidence: 99%