2006
DOI: 10.1016/j.jhazmat.2005.12.001
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Simultaneous removal of SO2 and NO by wet scrubbing using aqueous chlorine dioxide solution

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Cited by 207 publications
(114 citation statements)
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“…So, most of the researchers have focused on the oxidation technology, and wish to efficiently remove Hg 0 , SO 2 and NO simultaneously in the WFGD. The most commonly used oxidants include K 2 S 2 O 8 [17], KMnO 4 [18,19], Fenton's reagent [20,21], NaClO 2 [12,22], O 3 [5], H 2 O 2 [23,24], ClO 2 [25] and so on.…”
Section: Introductionmentioning
confidence: 99%
“…So, most of the researchers have focused on the oxidation technology, and wish to efficiently remove Hg 0 , SO 2 and NO simultaneously in the WFGD. The most commonly used oxidants include K 2 S 2 O 8 [17], KMnO 4 [18,19], Fenton's reagent [20,21], NaClO 2 [12,22], O 3 [5], H 2 O 2 [23,24], ClO 2 [25] and so on.…”
Section: Introductionmentioning
confidence: 99%
“…It is difficult to obtain the significant NO x removal efficiency because of the low solubility of nitric oxide (NO) that accounts for more than 90 % of all oxides of nitrogen as NO x (Jin et al 2006;Long et al 2008) by wet removal processes. Several authors have studied the use of various aqueous solutions (acid urea, hydrogen peroxide, sodium hypochlorite, sodium sulphite solutions, etc.)…”
Section: Introductionmentioning
confidence: 99%
“…Sci. 2017, 7, 377 2 of 10 oxidation have been reported [5][6][7][8][9][10][11][12], including gas phase catalytic oxidation, ozone oxidation, corona discharge oxidation, and liquid oxidation. After oxidation, the soluble NO2 can be further removed with SO2 in the subsequent absorption process [13].…”
Section: Methodsmentioning
confidence: 99%