2023
DOI: 10.1109/jphotov.2022.3226706
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SiNx and AlOx Nanolayers in Hole Selective Passivating Contacts for High Efficiency Silicon Solar Cells

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Cited by 7 publications
(4 citation statements)
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“…The ∆E v values in our case are 2.01 eV, 2.11 eV, and 2.15 eV, corresponding to T1, T2, and T3 devices. The higher value of ∆E v is helpful in blocking the holes from the TiO 2 /p-Si interface and, thus, beneficial in facilitating the selectivity of electron transport and blocking the holes [38].…”
Section: Resultsmentioning
confidence: 99%
“…The ∆E v values in our case are 2.01 eV, 2.11 eV, and 2.15 eV, corresponding to T1, T2, and T3 devices. The higher value of ∆E v is helpful in blocking the holes from the TiO 2 /p-Si interface and, thus, beneficial in facilitating the selectivity of electron transport and blocking the holes [38].…”
Section: Resultsmentioning
confidence: 99%
“…[16][17][18] Al 2 O 3 appears particularly promising in this role because of its negative fixed charge that could enhance its performance when coupled with hole-selective contacts. [15] Another potential hole-selective material is cuprous oxide (Cu 2 O). In contrast to the other hole-selective materials mentioned above, Cu 2 O promotes selectivity through a small valence DOI: 10.1002/solr.202300727 Passivating contacts based on transition metal oxides are of great interest for applications in crystalline silicon (c-Si) solar cells due to their improved optical transparency and potential cost reduction.…”
Section: Introductionmentioning
confidence: 99%
“…Some alternative interlayers include SiO 2 , Al 2 O 3 , and HfO 2 . [15,16] They improve the passivation of the surface at the expense of increasing the contact resistivity. [16][17][18] Al 2 O 3 appears particularly promising in this role because of its negative fixed charge that could enhance its performance when coupled with hole-selective contacts.…”
Section: Introductionmentioning
confidence: 99%
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