Single crystal diamond cantilever for micro-electromechanical systems

Fu, Jiao; Wang, Fei; Zhu, Tianfei; Wang, Wei; Liu, Zhangcheng; Li, Fengnan; Liu, Zongchen; Denu, Garuma Abdisa; Zhang, Jingwen; Wang, Hongxing; Hou, Xun

doi:10.1016/j.diamond.2016.10.011

Cited by 8 publications

(6 citation statements)

References 26 publications

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“…Electron beam induced etching (EBIE) [23][24][25][26] has recently emerged as a versatile technique that can be used to etch diamond with no damage detected by Raman and photoluminescence spectroscopy. 19 The technique is capable of single step, beam-directed chemical etching of a broad range of materials [27][28][29][30] with high spatial resolution (∼ 10 nm).…”

mentioning

confidence: 99%

“…Electron beam-induced etching (EBIE) − has recently emerged as a versatile technique that can be used to etch diamond with no damage detected by Raman and photoluminescence spectroscopy . The technique is capable of single step, beam-directed chemical etching of a broad range of materials − with high spatial resolution (∼10 nm). , Etching proceeds through material volatilization pathways driven by electron irradiation in the presence of a precursor gas and is typically performed using a scanning electron microscope (SEM).…”

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confidence: 99%

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Deterministic Nanopatterning of Diamond Using Electron Beams

et al. 2018

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Diamond is an ideal material for a broad range of current and emerging applications in tribology, quantum photonics, high-power electronics, and sensing. However, top-down processing is very challenging due to its extreme chemical and physical properties. Gas-mediated electron beam-induced etching (EBIE) has recently emerged as a minimally invasive, facile means to dry etch and pattern diamond at the nanoscale using oxidizing precursor gases such as O and HO. Here we explain the roles of oxygen and hydrogen in the etch process and show that oxygen gives rise to rapid, isotropic etching, while the addition of hydrogen gives rise to anisotropic etching and the formation of topographic surface patterns. We identify the etch reaction pathways and show that the anisotropy is caused by preferential passivation of specific crystal planes. The anisotropy can be controlled by the partial pressure of hydrogen and by using a remote RF plasma source to radicalize the precursor gas. It can be used to manipulate the geometries of topographic surface patterns as well as nano- and microstructures fabricated by EBIE. Our findings constitute a comprehensive explanation of the anisotropic etch process and advance present understanding of electron-surface interactions.

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confidence: 99%

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confidence: 99%

Deterministic Nanopatterning of Diamond Using Electron Beams

et al. 2018

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“…Fabrication of single-crystal diamond cantilever beam began from HPHT Ib (001) SCD substrate, which was selectively implanted by carbon ions with energy of 3 MeV 11 . Then a homoepitaxial layer was grown on the substrate by a microwave plasma chemical vapor deposition system at 1175 °C.…”

Section: Methodsmentioning

confidence: 99%

Fabrication of capacitive pressure sensor using single crystal diamond cantilever beam

Zhu

Liang

et al. 2019

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Fabrication of single crystal diamond capacitive pressure sensor is presented. Firstly, the single crystal diamond cantilever beam was formed on HPHT diamond substrate by using selective high-energy ion implantation, metal patterning, ICP etching and electrochemical etching techniques. Secondly, on this diamond cantilever beam, the desired electrode patterns were processed with photolithography and metal evaporation methods. Furthermore, the displacements of cantilever beam under different pressure conditions were investigated by atomic force microscopy. The capacitance-voltage curves of single crystal diamond cantilever beam and substrate under different force loading conditions were measured by using Agilent B1505A parameter analyzer. The results show that sensitivity increases with the enlargement of electrode area of cantilever beam, and decreases with the rise of measurement frequency.

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“…Examples of recent demonstrations in single crystal diamond micro- and nanosystem engineering include mechanical systems such as high-Q nanomechanical resonators 5 , extremely hard nanowire tips 6,7 , nanoindenters 8 , and stiff cantilevers 9 , and optical components such as micro-lenses 10,11 , gratings 12 , and microcavities 13 . In these applications, single crystal diamond permits excellent performance compared to similar structures made in any other material.…”

Section: Introductionmentioning

confidence: 99%

Precision micro-mechanical components in single crystal diamond by deep reactive ion etching

et al. 2018

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The outstanding material properties of single crystal diamond have been at the origin of the long-standing interest in its exploitation for engineering of high-performance micro-and nanosystems. In particular, the extreme mechanical hardness, the highest elastic modulus of any bulk material, low density, and the promise for low friction have spurred interest most notably for micro-mechanical and MEMS applications. While reactive ion etching of diamond has been reported previously, precision structuring of freestanding micro-mechanical components in single crystal diamond by deep reactive ion etching has hitherto remained elusive, related to limitations in the etch processes, such as the need of thick hard masks, micromasking effects, and limited etch rates. In this work, we report on an optimized reactive ion etching process of single crystal diamond overcoming several of these shortcomings at the same time, and present a robust and reliable method to produce fully released micro-mechanical components in single crystal diamond. Using an optimized Al/SiO 2 hard mask and a high-intensity oxygen plasma etch process, we obtain etch rates exceeding 30 µm/h and hard mask selectivity better than 1:50. We demonstrate fully freestanding micro-mechanical components for mechanical watches made of pure single crystal diamond. The components with a thickness of 150 µm are defined by lithography and deep reactive ion etching, and exhibit sidewall angles of 82°-93°with surface roughness better than 200 nm rms, demonstrating the potential of this powerful technique for precision microstructuring of single crystal diamond.

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Single crystal diamond cantilever for micro-electromechanical systems

Cited by 8 publications

References 26 publications

Deterministic Nanopatterning of Diamond Using Electron Beams

Deterministic Nanopatterning of Diamond Using Electron Beams

Fabrication of capacitive pressure sensor using single crystal diamond cantilever beam

Precision micro-mechanical components in single crystal diamond by deep reactive ion etching

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