Single crystal growth of ZnS by the method of gas source MBE

Kaneda, Shigeo; Satou, Shuji; Setoyama, Takao; Motoyama, Shin-ichi; Yokoyama, M.; Ota, Norio

doi:10.1016/0022-0248(86)90391-x

Cited by 18 publications

(1 citation statement)

References 15 publications

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“…4 ZnS thin ®lms have been produced by a variety of vacuum and nonvacuum methods. Molecular beam epitaxy (MBE) 5,6 and metal±organic chemical vapour deposition (MOCVD) 7,8 are widely reported vacuum techniques. Non-vacuum techniques include chemical bath deposition, 9 successive ionic layer adsorption and reaction (SILAR), 10 spray pyrolysis 11,12 and atmospheric pressure chemical vapour deposition (APCVD) with high deposition rate.…”

Section: Introductionmentioning

confidence: 99%

Synthesis, microstructure and optical properties of ZnS films formed by electrostatic assisted aerosol jet deposition

Choy

2000

J. Mater. Chem.

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ZnS ®lms were synthesised using a novel electrostatic assisted aerosol jet deposition (EAAJD) technique at temperatures above 450 ³C from an aqueous solution of zinc chloride and thiourea. The ®lms showed a mixture of hexagonal and cubic structures and strong preferred orientations, with the c-axis normal to ®lm surface. Annealing at higher temperatures improved the crystallinity of the as-deposited ®lms. However, ZnO was formed when the as-deposited ®lms were annealed in air. The ZnS ®lms exhibit a planar structure with small crystal sizes (v200 nm). The optical direct bandgap values (3.35±3.46 eV) of the as-deposited ®lms were lower than reported values for polycrystalline ZnS, probably owing to their poor crystallinity and partial oxidation.

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